This review focuses on the use of diagnostic tools to examine plasma processing chemistry, primarily plasma species energetics, dynamics, and molecule-surface reactions. We describe the use of optical diagnostic tools, mass spectrometry, and Langmuir probes in measuring species densities, rotational and kinetic energies, and plasma-surface reactions. Molecule-surface interactions for MX(n) species (M = C, Si, N; X = H, F, Cl) are presented and interpreted with respect to the molecule's electronic configuration and dipole moments.

Acid-base properties of metal oxides and polymers can control adhesion properties between materials, electrical properties, the physical structure of the material and gas adsorption behavior. To determine the relationships between surface isoelectric point, chemical composition and aging effects, plasma-surface treatment of amorphous silicon oxynitride (SiO x N y ) substrates was explored using Ar, H 2 O vapor, and NH 3 inductively coupled rf plasmas. Overall, the Ar plasma treatment resulted in nonpermanent changes to the surface properties, whereas the H 2 O and NH 3 plasmas introduced permanent chemical changes to the SiO x N y surfaces. In particular, the H 2 O plasma treatments resulted in formation of a more ordered SiO 2 surface, whereas the NH 3 plasma created a nitrogen-rich surface. The trends in isoelectric point and chemical changes upon aging for one month suggest that contact angle and composition are closely related, whereas the relationship between IEP and composition is not as directly correlated.

Surface isoelectric point, contact angle (CA), chemical composition, film growth method, and aging effects were measured for plasma‐surface treatment of two different types of SiO2 substrates. The relationship between these values was explored using X‐ray photoelectron spectroscopy and CA titrations. Two plasma systems, Ar and H2O vapor inductively coupled rf plasmas were used to induce hydrophilic surface modifications on the SiO2 substrates. The SiO2 films deposited from a hexamethylsiloxane/O2 plasma were less susceptible to aging effects after plasma treatment than the native oxide layers. The stability of these surfaces is attributed to their relative thickness and mild annealing experienced during film formation.

In addition to drinking water resources, the need for clean water in many industrial processes is critical. Among potential contaminants, those associated with fuel oxygenate additives (e.g. MTBE) are of concern as they partition into aqueous phases. Development of methods for detection and decontamination, including plasma pollution control, have been the objective of many studies. Here, inductively‐coupled rf plasmas were used for detection of organic contaminants (CH3OH, MTBE) in water. Parent molecule decomposition was followed using actinometric OES. Emission from CO* yielded a detection limit of 0.01 ppm for each compound. Complementary mass spectrometry data were also collected to explore decomposition mechanisms.

Adhesion and delamination behavior of amorphous carbon nitride (a-CN(x)) is critical to development of wear resistant materials and protective coatings. Here, the composition and delamination behavior of a-CN(x) films was explored utilizing BrCN, CH₃CN, and CH₄ as film precursors, either alone or in combination with one another. Film delamination depends on film thickness and plasma composition as well as post deposition treatment conditions. Delamination is not observed with films deposited from 100% CH₃CN discharges, whereas films of similar thickness deposited from 100% BrCN plasmas delaminate almost immediately upon exposure to atmosphere. Exploration of these differences in delamination behavior is discussed relative to contributions of humidity, hydrocarbon species, and ion bombardment during deposition in conjunction with compositional studies using X-ray photoelectron spectroscopy (XPS).