Acid-base properties of metal oxides and polymers can control adhesion properties between materials, electrical properties, the physical structure of the material and gas adsorption behavior. To determine the relationships between surface isoelectric point, chemical composition and aging effects, plasma-surface treatment of amorphous silicon oxynitride (SiO x N y ) substrates was explored using Ar, H 2 O vapor, and NH 3 inductively coupled rf plasmas. Overall, the Ar plasma treatment resulted in nonpermanent changes to the surface properties, whereas the H 2 O and NH 3 plasmas introduced permanent chemical changes to the SiO x N y surfaces. In particular, the H 2 O plasma treatments resulted in formation of a more ordered SiO 2 surface, whereas the NH 3 plasma created a nitrogen-rich surface. The trends in isoelectric point and chemical changes upon aging for one month suggest that contact angle and composition are closely related, whereas the relationship between IEP and composition is not as directly correlated.