Deposition of Chromium Thin Films on Stainless Steel-304 Substrates Using a Low Energy Plasma Focus Device

Abstract

In this paper, we study thin films of chromium deposited on stainless steel-304 substrates using a low energy (1.6 kJ) plasma focus device. The films of chromium are likewise deposited with 25 focus shots each at various axial distances from the top of the anode (3, 5, 7, 9 and 11 cm). We also consider different angular positions with respect to the anode axis (0°, 15°and 30°) at a distance of 5 cm from the anode tip to deposit the chromium films on the stainless steel substrates. To characterize the structural properties of the films, we benefit from X-ray diffraction (XRD) analysis. Atomic force microscopy (AFM) and scanning electron microscopy (SEM) are applied as well to study the surface morphology of these deposited films. Furthermore, we make use of Vicker's micro-hardness measurements to investigate the mechanical properties of chromium thin films. The XRD results show that the degree of crystallinity of chromium thin films depends on the substrate axial and angular positions. The AFM images illustrate that the film deposited at the distance of 5 cm and the angular position of 0°has quite a uniform surface with homogeneous distribution of grains on the film surface. From the hardness results, we observe that the sample deposited at the axial distance of 5 cm from the anode tip and at the angle of 0°with respect to the anode axis, is harder than the other deposited films.

Pelapisan Permukaan Baja Tahan Karat Aisi 304 Dengan Khrom Oksida Menggunakan Metoda Sputtering

“…Dengan demikian, proses sputtering ini belum sempurna karena belum terbentuk senyawa Cr2O3 yang kompak dan sangat keras dengan titik leleh 2.435 C, densitas 5,22 g/cm 3 , dan struktur kristalnya heksagonal. Menurut diagram Ellingham, senyawa Cr2O3 terbentuk pada temperatur tinggi dan tekanan gas O2 tinggi [14,15].…”

Corrosion resistance and surface microstructure of Mg3N2/SS thin films by plasma focus instrument

“…However, the synthesis of single‐crystalline Mg 3 N 2 in the form of nanowires or thin films remains a significant challenge (John et al, 2020). In this regard, the plasma focus (PF) instrument is an effective tool for synthesizing thin films with improved surface properties (Habibi et al, 2014; Hussain et al, 2009; Javadi et al, 2012; Khan et al, 2013; Rawat et al, 2008; Zeb et al, 2007).…”