1997
DOI: 10.1063/1.364104
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Deposition of diamond films on SiO2 surfaces using a high power microwave enhanced chemical vapor deposition process

Abstract: Diamonds were successfully nucleated on SiO 2 -coated silicon substrates using a high power microwave plasma enhanced chemical vapor deposition process. Nucleation rates on SiO 2 surfaces ͑i.e., 0.5ϫ10 10 cm Ϫ2 ͒ were, however, still smaller than those on Si surfaces ͑i.e., 1.0ϫ10 10 cm Ϫ2 ͒. The major advantage in using high power microwaves was revealed by optical emission spectroscopy to be that the atomic C and H species produced are more abundant and energetic. Therefore, the negative bias effect is enabl… Show more

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Cited by 8 publications
(2 citation statements)
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“…The term chemical vapor infiltration (CVI) refers to the internal coating of porous preforms. Well-known examples are CVD/CVI synthesis of SiC from SiCl 4 /CH 4 or CH 3 SiCl 3 , being used for example for the processing of large-scale high-temperature SiC matrix fiber composites or for CVD-coatings of diamond-like carbon (DLC) [11].…”
Section: Structural Ceramic Thin Films For Anti-wear and Anti-corrosimentioning
confidence: 99%
“…The term chemical vapor infiltration (CVI) refers to the internal coating of porous preforms. Well-known examples are CVD/CVI synthesis of SiC from SiCl 4 /CH 4 or CH 3 SiCl 3 , being used for example for the processing of large-scale high-temperature SiC matrix fiber composites or for CVD-coatings of diamond-like carbon (DLC) [11].…”
Section: Structural Ceramic Thin Films For Anti-wear and Anti-corrosimentioning
confidence: 99%
“…However, the difficulty in controlling the size, texture, and crystalline quality of the diamond grains and in achieving concrete coating is reflected in many of these works. There are many reports on growth of diamond films on a -SiO 2 surfaces using a high-power microwave plasma enhanced chemical vapor deposition (MPECVD) technique; however, no method of coating nanocrystalline diamond (NCD) onto silica ( a -SiO 2 ) nanofibers has been reported.…”
Section: Introductionmentioning
confidence: 99%