“…We and others have reported protocols to achieve high resolution pattern transfer (10 nm resolution demonstrated in some cases) from DNA templates to SiO 2 , Si, graphene, polymer, and SAMs. [19][20][21][22][23][24][25][26] Here, we show the programmability Site-specific doping is an essential component in the manufacturing of almost all semiconductor devices, such as transistors, [1,2] sensors, [3] and photovoltaics. [4] The doping type (n or p), concentration, and spatial profile of the dopant atoms impact many, if not all, operation characteristics of the device.…”