Deposition of hard crystalline Al2O3 coatings by pulsed d.c. PACVD

Täschner, Christine; Ljungberg, Björn; Endler, I.; Leonhardt, A.

doi:10.1016/s0257-8972(99)00148-6

Cited by 31 publications

(8 citation statements)

References 16 publications

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“…Figure demonstrates R dep in the Arrhenius format, and is compared with the results presented in previous literature . The R dep in the present study displayed the maximum value of 58 μm/h at P w = 1.4 kW and P tot = 200 Pa, which is 10‐108 times greater than those of conventional thermal CVD (TCVD) and metal‐organic CVD (MOCVD).…”

Section: Resultssupporting

confidence: 71%

Structural investigation of Al₂O₃ coatings by PECVD with a high deposition rate

Zhang

Zheng

Wang

et al. 2019

Int J Applied Ceramic Tech

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The deposition of alumina on thermal barrier coatings can effectively avoid hot corrosion and increase durability. Al 2 O 3 coatings were prepared on an yttria-stabilized zirconia (YSZ) substrate by plasma chemical vapor deposition (CVD). The effects of microwave power (P M ) and total pressure (P tot ) on the crystalline phase and microstructure of Al 2 O 3 coatings were investigated, and the effect of the mechanism on the deposition rate was also analyzed. The α-Al 2 O 3 coatings with a needle-like microstructure were formed at a higher P M and P tot , whereas the γ-phase coatings exhibited a cauliflower-like microstructure at a lower P M and P tot . A maximum deposition rate (R dep ) of 58 μmh −1 was obtained, which is significantly higher than those of conventional CVD methods. K E Y W O R D S alumina, chemical vapor deposition, coatings | 1357 ZHANG et Al. How to cite this article: Zhang S, Zheng L, Wei G, et al. Structural investigation of Al 2 O 3 coatings by PECVD with a high deposition rate. Int J Appl Ceram

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Section: Resultssupporting

confidence: 71%

Structural investigation of Al₂O₃ coatings by PECVD with a high deposition rate

Zhang

Zheng

Wang

et al. 2019

Int J Applied Ceramic Tech

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“…The grain size was estimated from the Sherrer equation and is approximately ∼5 nm for both phases. Taschner et al4 reported crystal size in the range of 10 nm for α‐alumina at a deposition temperature of 800 °C. One should note that the increased NIF can eventually lead to an increase of the stress in the alumina films24 which in turn can result in a under estimation of the grain size when using the Sherrer formalism 25…”

Section: Resultsmentioning

confidence: 99%

“…During chemical vapor deposition (CVD) experiments, a relatively high deposition temperature (1 000 °C) is needed and substrate material selection is therefore restricted 3. Bipolar pulsed plasma enhanced chemical vapor deposition (PECVD) enables growth of α‐alumina at temperatures <600 °C (i.e., at low temperature) because part of the energy required for the formation of α‐alumina is supplied by the plasma 4–8. The reported deposition rates for PECVD α‐alumina are of the order of ∼10 nm min −1 5, 7.…”

Section: Introductionmentioning

confidence: 99%

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Pulsed Plasma Enhanced Chemical Vapor Deposition of Alumina Thin Films: Influence of the Duty Cycle on Structure and Elastic Properties

Konstantinidis

Jiang

Roobroek

et al. 2011

Plasma Processes & Polymers

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In this study, the duty cycle (Δ) has been systematically modified during the pulsed plasma enhanced chemical vapor deposition (PECVD) of alumina (Al2O3) coatings. This deposition method is prone to chlorine incorporation during growth as AlCl3 is used as precursor. Here, we show that the incorporation of chlorine can be reduced from 2.4 ± 0.1 to 1.2 ± 0.1 at.‐% by increasing Δ from 62% to 91%. The film grown at Δ = 88% has a density of 3.85 ± 0.12 g cm−3 (96% of α‐alumina bulk density) and an elastic modulus of 365 ± 50 GPa (∼83% of the bulk α‐alumina value). Δ affects the normalized ion flux (NIF), which is the ratio between the flux of bombarding ions and the flux of deposited material. By increasing Δ, the formation of α‐rich alumina is promoted at 560 °C, the chlorine content is reduced, and the film is densified. An increased Δ and hence NIF results in enhanced ion bombardment of the film surface during growth, promoting chlorine desorption. Furthermore, it is reasonable to assume that the deposition rate decrease measured is a consequence of increasing Δ and hence NIF. Both the density as well as the elastic modulus increase measured is consistent with the increased NIF caused by increasing the duty cycle.

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“…However, during high‐speed metal cutting, the coating temperature reaches 1200 K or more, and the hardness of the alumina coating is higher. Table summarizes the reports of deposition of Al 2 O 3 coatings by CVD methods. Currently, Al 2 O 3 coatings are synthesized on Ti(C, N)‐based cermets mainly by thermal CVD (TCVD).…”

Section: Introductionmentioning

confidence: 99%

Synthesis of Al₂O₃ coatings on Ti(C, N)‐based cermets by microwave plasma CVD using Al(acac)₃

Yuan

Guo

et al. 2019

Int J Applied Ceramic Tech

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Aluminum acetylacetonate (Al(acac) 3 ) was used as a precursor to synthesize aluminum oxide (Al 2 O 3 ) coatings on Ti(C, N)-based ceramic by microwave plasma CVD (MPCVD). Al 2 O 3 coatings transformed from γ phase to δ phase and α phase and as microwave power (p M ) and total pressure (P tot ) increased. The effects of p M and P tot on the microstructure of the Al 2 O 3 coating and oxidation of the substrate have been investigated. The relationship between phase structure and adhesive strength of the coatings was also studied. Coatings deposited at p M = 1.0-1.2 kW and P tot = 400 Pa exhibited good adhesion strength (Class 1). K E Y W O R D S adhesion, Al 2 O 3 coating, microstructure, microwave plasma CVD, Ti(C, N) cermets

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Deposition of hard crystalline Al2O3 coatings by pulsed d.c. PACVD

Cited by 31 publications

References 16 publications

Structural investigation of Al₂O₃ coatings by PECVD with a high deposition rate

Structural investigation of Al₂O₃ coatings by PECVD with a high deposition rate

Pulsed Plasma Enhanced Chemical Vapor Deposition of Alumina Thin Films: Influence of the Duty Cycle on Structure and Elastic Properties

Synthesis of Al₂O₃ coatings on Ti(C, N)‐based cermets by microwave plasma CVD using Al(acac)₃

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Deposition of hard crystalline Al2O3 coatings by pulsed d.c. PACVD

Cited by 31 publications

References 16 publications

Structural investigation of Al2O3 coatings by PECVD with a high deposition rate

Structural investigation of Al2O3 coatings by PECVD with a high deposition rate

Pulsed Plasma Enhanced Chemical Vapor Deposition of Alumina Thin Films: Influence of the Duty Cycle on Structure and Elastic Properties

Synthesis of Al2O3 coatings on Ti(C, N)‐based cermets by microwave plasma CVD using Al(acac)3

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Product

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Structural investigation of Al₂O₃ coatings by PECVD with a high deposition rate

Structural investigation of Al₂O₃ coatings by PECVD with a high deposition rate

Synthesis of Al₂O₃ coatings on Ti(C, N)‐based cermets by microwave plasma CVD using Al(acac)₃