“…Many deposition techniques have been employed to deposit thin films of metal sulfides including metal organic chemical vapor deposition (MOCVD) [9], aerosol assisted chemical vapor deposition (AACVD) [10,11], chemical precipitation [12], plasma source ion sulfuration [7], thermal spray [13], electro-deposition [8,14], hydrothermal method [5], sputtering [15,16] and chemical bath deposition (CBD) [17]. The last of these methods has, however, so far attracted considerable attention.…”