Deposition of optical coatings with real time control by the spectroellipsometry

Bulkin, Pavel; Daineka, D.; Kouznetsov, Dmitrii; Drévillon, B.

doi:10.1051/epjap:2004191

Cited by 4 publications

(6 citation statements)

References 19 publications

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“…Real-time least square fit [1] on the physical thickness only, or on both the physical thickness and the refractive index of the material at the different wavelengths, is done.…”

Section: Resultsmentioning

confidence: 99%

“…1 Introduction Several interesting methods have been developed for the control of depositions by kinetic ellipsometry, such as the direct inversion method and the ellipsometric trajectory control methods [1][2][3][4]. In the ellipsometric trajectory methods, a comparison between the current measured and the theoretical expected points (I C , I S ) can be done, as well as fitting between these points in order to detect the stop point for the current deposited layer.…”

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confidence: 99%

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Multilayer optical filters control by multi‐channel kinetic ellipsometry

Ibrahim

Botha

Bulkin

et al. 2008

Phys. Status Solidi (c)

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The use of multi‐wavelength kinetic ellipsometry control for the deposition of multilayer filters is presented. Two different control methods are described and their use for the fabrication of different types of optical filters is illustrated. We fit the ellipsometric data with a model and adjust the physical thickness during deposition to ensure the conservation of the optical thickness. In order to illustrate this method and to show its importance in the case of periodic structures or single layer control, a Bragg mirror and a resonator layer in a Fabry‐Perot filter were grown using Matrix Distributed Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition (MDECR‐PECVD). The use of fitting both the index and thickness for control of the physical thickness is also shown. The importance of this method for manufacturing non‐periodic multilayer structures is demonstrated by the controlled deposition of an antireflection coating. The different features of these two methods are presented. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

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“…Real-time least square fit [1] on the physical thickness only, or on both the physical thickness and the refractive index of the material at the different wavelengths, is done.…”

Section: Resultsmentioning

confidence: 99%

mentioning

confidence: 99%

Multilayer optical filters control by multi‐channel kinetic ellipsometry

Ibrahim

Botha

Bulkin

et al. 2008

Phys. Status Solidi (c)

Self Cite

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“…The main methods of monitoring thin-film thickness primarily contain the PEEMM (photoelectric extrema monitoring method), the quartz crystal oscillation method, the scanning ellipsometer by synchronous rotation of polarizer and analyzer, and the wide spectrum monitoring method [6][7][8][9][10] , etc. Especially, in monitoring optical thin-film thickness, the application of PEEMM is more extensive than other methods.…”

Section: New Construction and Principles Of Intelligent Thinfilm Thicmentioning

confidence: 99%

New Structure and Physical Characteristics of Intelligent Real-time Control on Optical Coating

Xu¹,

Ren²,

Zhang³

2013

Proceedings of the 2013 International Conference on Advanced Computer Science and Electronics Information

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-Comparing general optical thin-film deposition systems, which present poor precision and automation level on monitoring film thickness, we proposed a new intelligent photoelectric-control-analysis coating system. The structure of the new system includes a four-light path photoelectric system matching with double-frequency modulation hardware equipment and a compound filteration-control system. The compound filterationcontrol system contains anti-disturbance circuit, analog circuits of multi-stage amplifier, symmetrical dual-lock-phase amplifier, digital division, anti-pulse-disturbance digital filter, linearization of digital display, algorithm of picking off singular data, and extremumjudgment algorithm. Experiments show that all functions of intelligent real-time monitoring film thickness are achieved. The physical characteristics, for example, the static and dynamic stabilities and the control thin-film thickness precision, are extremely increased. The resolution of digital display as per reflectivity is 0.02%. The duplication, i.e., standard deviation of monitoring thinfilm thickness, is less than 0.50%. The S/N approaches to 1500. The linearity of drift is very high, and the static drift ratio is close to 1.63%/h. In conclusion，the new system has advantages of the high control precision for thin-film thickness and the favorable static and dynamic stabilities.

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“…The unknown parameters are the real refractive index and the thickness of the top layer. The above stated ellipsometric task is of great practical importance, for example when using ellipsometry for open or closed loop control in applications involving multiple layer deposition (optical coatings, filters), etching processes and others [2].…”

Section: Derivation Of the Fifth Degree Polynomialmentioning

confidence: 99%

“…As the solution of the inverse ellipsometric problem is usually not unique, it is very important to find all the mathematical solutions in order to select among them physically meaningful ones. As a consequence of the above, the minimization approach is not time deterministic, making it unsuitable for important ellipsometric applications such as real time parameter estimation and closed loop process control [2].…”

Section: Introductionmentioning

confidence: 99%

Exact polynomial inversion for top transparent layer parameters on an arbitrary substrate in ellipsometry

Russev¹,

Tsutsumanova²,

Drolet³

2008

J. Phys.: Condens. Matter

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We consider the inverse ellipsometric problem for a transparent layer on top of an isotropic substrate, which may consist of an arbitrary number of plane parallel homogeneous layers with complex refractive indexes, or have an arbitrary depth profile variation of the complex refractive index. It is shown that the task of finding the top layer parameters can be split into two. First, the top layer dielectric constant is determined by the roots of a fifth degree polynomial and then the layer thickness is found. Error propagation analysis is provided on a sample system and the stability of the method is estimated.

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Deposition of optical coatings with real time control by the spectroellipsometry

Cited by 4 publications

References 19 publications

Multilayer optical filters control by multi‐channel kinetic ellipsometry

Multilayer optical filters control by multi‐channel kinetic ellipsometry

New Structure and Physical Characteristics of Intelligent Real-time Control on Optical Coating

Exact polynomial inversion for top transparent layer parameters on an arbitrary substrate in ellipsometry

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