2022
DOI: 10.1016/j.jallcom.2021.162806
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Deposition of the tin sulfide thin films using ALD and a vacuum annealing process for tuning the phase transition

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Cited by 20 publications
(7 citation statements)
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“…In addition, the A 1g mode peak of SnS 2 gradually decreased as the doping concentration of zinc increased from 49:1 to 9:1 because the binding of tin and sulfur was destroyed by incorporation of zinc atoms or the zinc substitution of tin sites changed atomic arrangements and film crystallinity. In addition, a Raman peak at 303 cm −1 in a thin film with a Sn/Zn ratio of 11.5:1 was determined to be a second-order ZnS Raman peak 34 scattered in the crystalline ZnS layer, and a broader range of Raman shift is shown in Figure S5. In the case of an increasing zinc doping concentration of 9:1, lattice distortion occurred as in the previous GI-XRD result, and crystallinity decreased.…”
Section: ■ Results and Discussionmentioning
confidence: 99%
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“…In addition, the A 1g mode peak of SnS 2 gradually decreased as the doping concentration of zinc increased from 49:1 to 9:1 because the binding of tin and sulfur was destroyed by incorporation of zinc atoms or the zinc substitution of tin sites changed atomic arrangements and film crystallinity. In addition, a Raman peak at 303 cm −1 in a thin film with a Sn/Zn ratio of 11.5:1 was determined to be a second-order ZnS Raman peak 34 scattered in the crystalline ZnS layer, and a broader range of Raman shift is shown in Figure S5. In the case of an increasing zinc doping concentration of 9:1, lattice distortion occurred as in the previous GI-XRD result, and crystallinity decreased.…”
Section: ■ Results and Discussionmentioning
confidence: 99%
“…SnS 2 /Zn thin films were deposited using a showerhead-type ALD reactor. The precursors for tin sulfide thin film deposition via ALD include tetrakis-(dimethylamino)­tin­(IV) (TDMASn) and tin­(IV) acetate, and precursors for zinc sulfide thin film deposition are diethy-zinc (DEZ) and bis­(2,2,6),6-tetramethyl-3,5-heptanedionato)zinc (Zn­(TMHD) 2 ). In this work, we used TDMASn as a tin precursor, hydrogen sulfide (H 2 S) gas as a reactant, and DEZ as a zinc precursor. TDMASn was maintained at 50 °C, and DEZ was maintained at room temperature.…”
Section: Methodsmentioning
confidence: 99%
“…Figure c,e shows the cutoff energy ( E cutoff ) at high binding energy for α-Fe 2 O 3 and Fe 1.6 In 0.4 O 3 NWs. The work function ( W F ) of one material is determined by eq 2: W F = h ν – | E cutoff – E f(Au) |, where h ν and E f(Au) refer to the incident photon energy of He I UV source and E f of standard Au sample, respectively, which equal 21.22 and 0.07 eV in this test. Fermi levels of α-Fe 2 O 3 and Fe 1.6 In 0.4 O 3 NWs were calculated to be −3.94 and −3.64 eV.…”
Section: Resultsmentioning
confidence: 99%
“…Metal chalcogenide materials are considered as excellent absorber materials in photovoltaic cell applications [105,106]. These materials exhibited excellent absorption co-efficient and suitable band gap value to adsorb the maximum number of photons from sun radiation [107,108].…”
Section: Metal Sulphide Metal Telluride and Metal Selenide Thin Film ...mentioning
confidence: 99%