Deposition of transparent and conductive ZnO films by an atmospheric pressure plasma-jet-assisted process

Deposition of ZnO Thin Films by an Atmospheric Pressure Plasma Jet-Assisted Process: The Selection of Precursors

“…2(a) shows the films deposited using ZC-containing solution as the precursor. This precursor is found to be able to deposit smooth ZnO films with a root-mean-square roughness of 8.6 nm, a visible light transmittance >80%, and a resistivity of 1.4 cm as reported in [12] and [27]. As reported in the literature, a lower deposition rate is obtained when ZC solution is used as the precursor in a spray pyrolysis process comparing with ZN and ZA [28].…”

“…As reported in the literature, a lower deposition rate is obtained when ZC solution is used as the precursor in a spray pyrolysis process comparing with ZN and ZA [28]. In addition, the conversion of ZC solution droplets to ZnO films upon reaction with the plasma requires the formation of an intermediate, zinc hydroxide chloride [12], [27], [29]. As will be indicated in the following section, such a relatively slow ZC solution dropletto-ZnO conversion rate is a key to the formation of a smooth film in this APPJ-assisted ZnO-deposition process.…”

High speed atmospheric plasma deposition of transparent ZnO thin films without post-deposition annealing

“…Furthermore, it underlines that with the above-mentioned experimental conditions, the reactivity in the afterglow zone where the microdroplets are injected is too weak and/or the residence time of the microdroplets in the afterglow is too short to achieve complete conversion into ZnO. With ZnCl 2 in aqueous solution as precursor, incomplete conversion leading to zinc hydroxide chloride has already been reported [11]. To both increase reactivity and residence time, we could reduce the plasma air flow [14].…”

“…N 2 discharge is generated by a pulsed direct current power supply between two cylindrical electrodes. In some examples, ZnCl 2 in aqueous solution was atomized to form mists by an ultrasonic nebulizer and injected into the downstream [10,11]. Chang et al have reported the use of APPJ for indium doped ZnO deposition from nitrate based precursors [12].…”

Atmospheric-pressure plasma jet processed SnO2/CNT nanocomposite for supercapacitor application

“…This leads to versatile application of APPs such as sterilization and bacteria inactivation [6,7], surface modification [1,8,9], materials deposition [10][11][12][13], syntheses of quantum dots and nanoparticles [14][15][16], and rapid sintering of nanoporous ceramics and composites [17][18][19][20][21][22].…”