Deposition of zinc oxide thin films by an atmospheric pressure plasma jet

Deposition of ZnO Thin Films by an Atmospheric Pressure Plasma Jet-Assisted Process: The Selection of Precursors

“…2(a) shows the films deposited using ZC-containing solution as the precursor. This precursor is found to be able to deposit smooth ZnO films with a root-mean-square roughness of 8.6 nm, a visible light transmittance >80%, and a resistivity of 1.4 cm as reported in [12] and [27]. As reported in the literature, a lower deposition rate is obtained when ZC solution is used as the precursor in a spray pyrolysis process comparing with ZN and ZA [28].…”

High speed atmospheric plasma deposition of transparent ZnO thin films without post-deposition annealing

“…Some experimental key-parameters like scan speed, distance between nozzle and substrate and precursor flow rate have been determined in order to obtain effective conversion of zinc nitrate into ZnO. Without the need of annealing post-treatments, optimal conditions (Φ Zn = 100 μL·min −1 -v = 50 mm·s −1 -D = 10 mm) have led to transparent (%T N 70%) ZnO thin film (135 nm) at high deposition rate (6.9 nm·m −2 ·s −1 ) compared to those obtained with most of low or atmospheric pressure processes [10].…”

“…N 2 discharge is generated by a pulsed direct current power supply between two cylindrical electrodes. In some examples, ZnCl 2 in aqueous solution was atomized to form mists by an ultrasonic nebulizer and injected into the downstream [10,11]. Chang et al have reported the use of APPJ for indium doped ZnO deposition from nitrate based precursors [12].…”

Atmospheric-pressure plasma jet processed SnO2/CNT nanocomposite for supercapacitor application

“…This leads to versatile application of APPs such as sterilization and bacteria inactivation [6,7], surface modification [1,8,9], materials deposition [10][11][12][13], syntheses of quantum dots and nanoparticles [14][15][16], and rapid sintering of nanoporous ceramics and composites [17][18][19][20][21][22].…”