Deposition of ZnO film using an open-air cold plasma generator

Suzaki, Yoshifumi; Ejima, S.; Shikama, Tomokazu; Azuma, Shunryo; Tanaka, Osamu; Kajitani, Takahiro; Koinuma, Hideomi

doi:10.1016/j.tsf.2005.08.166

Cited by 23 publications

(14 citation statements)

References 6 publications

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“…Values shorter than tens of nanoseconds are more suitable to get homogeneous DBD 38. In fact, homogeneous pulsed DBD have been observed in helium as carrier gas39, 40 or with very short pulses (10–100 ns) 41, 42. Other conditions lead to filamentary discharges 43–47.…”

Section: Discharge Regimes and Energetic Speciesmentioning

confidence: 99%

Atmospheric Pressure Low Temperature Direct Plasma Technology: Status and Challenges for Thin Film Deposition

Massines

Sarra-Bournet

Fanelli

et al. 2012

Plasma Processes & Polymers

309

327

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Over the last ten years, expansion of atmospheric pressure plasma solutions for surface treatment of materials has been remarkable, however direct plasma technology for thin film deposition needs still great effort. The objective of this paper is to establish the state of the art on scientific and technologic locks, which have to be opened to consider direct atmospheric pressure plasma‐enhanced chemical vapor deposition (AP‐PECVD) a viable option for industrial application. Basic scientific principles to understand and optimize an AP‐PECVD process are summarized. Laboratory reactor configurations are reviewed. Reference points for the design and use of AP‐PECVD reactors according to the desired thin film properties are given. Finally, solutions to avoid powder formation and to increase the thin film growth rate are discussed.

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Section: Discharge Regimes and Energetic Speciesmentioning

confidence: 99%

Atmospheric Pressure Low Temperature Direct Plasma Technology: Status and Challenges for Thin Film Deposition

Massines

Sarra-Bournet

Fanelli

et al. 2012

Plasma Processes & Polymers

309

327

View full text Add to dashboard Cite

show abstract

“…8 Recently, the use of submicrosecond voltage pulses has been shown to control effectively the GAT transition. [9][10][11][12] These submicrosecond pulsed atmospheric plasmas are glow discharges generated uniformly between two large parallel-plate electrodes and are different from pulsed corona discharges that are ineffective for large-scale surface treatment. 13 In this study, we report a 10 ns pulsed atmospheric air plasma and its uniform treatment of polypropylene films.…”

mentioning

confidence: 99%

10 ns pulsed atmospheric air plasma for uniform treatment of polymeric surfaces

Walsh

Kong

2007

Applied Physics Letters

174

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This letter reports an experimental study of a 10ns pulsed dielectric barrier discharge in atmospheric air, excited with a train of 65ns voltage pulses at a repetition frequency of 5kHz. It is shown that these ultrashort pulses produce a homogenous discharge with very high electron density in excess of 1013cm−3 and low gas temperature, which are particularly desirable for uniform treatment of thermally sensitive polymer films. Their treatment of polypropylene films is found to introduce microscale surface patterns as well as various carbon-oxygen bonds, both useful for improving the hydrophilic properties of polymeric materials.

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“…Suzaki et al have reported an open air plasma reactor which was utilized for the preparation of flat zinc oxide films. They investigated the effect on the films of the addition of oxygen to the plasma gas and could conclude the same as Battiston et al for TiO 2 films: an increasing deposition rate, but with negative effects, such as a rougher surface structure, on the film's morphology 62…”

Section: Catalyst Synthesismentioning

confidence: 92%

The Use of Non‐Equilibrium Plasmas for the Synthesis of Heterogeneous Catalysts

Witvrouwen

Paulussen

Sels

2012

Plasma Processes & Polymers

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A review of published works in the field of catalyst synthesis and treatment with the use of non‐equilibrium plasma techniques has been composed. Non‐equilibrium plasmas, also called low temperature plasmas, are known for their high reactivity (high electron temperature), while keeping the overall gas temperature low. Non‐equilibrium plasmas are often applied for dry surface modifications as an environment friendly alternative for solvent‐based techniques. In the field of heterogeneous catalysis, non‐equilibrium plasmas are most commonly used for the treatment of catalytically active surfaces. Such applications can result into highly dispersed catalysts with high activity and stability, such as photo‐catalytically active titanium dioxide films. Moreover, (non‐equilibrium) plasma‐assisted chemical vapor deposition can also be used for the synthesis of powder‐like materials used in heterogeneous catalysis for a wide range of applications, for example, ultrafine Fe2O3. The research field is still emerging, but already proves to be very promising, as will be shown in the review.

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Deposition of ZnO film using an open-air cold plasma generator

Cited by 23 publications

References 6 publications

Atmospheric Pressure Low Temperature Direct Plasma Technology: Status and Challenges for Thin Film Deposition

Atmospheric Pressure Low Temperature Direct Plasma Technology: Status and Challenges for Thin Film Deposition

10 ns pulsed atmospheric air plasma for uniform treatment of polymeric surfaces

The Use of Non‐Equilibrium Plasmas for the Synthesis of Heterogeneous Catalysts

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