Deposition of ZnO thin films by RF&amp;DC magnetron sputtering on silicon and porous-silicon substrates for pyroelectric applications

Çiçek, Kenan; Karacalı, Tevhit; Efeoǧlu, Hasan; Çakmak, Bülent

doi:10.1016/j.sna.2017.04.007

Cited by 9 publications

(6 citation statements)

References 20 publications

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“…K. Cicek et al formed ZnO on PS and silicon utilizing the RF&DC magnetron sputtering technique with a flow rate of Ar and O 2 at 120 W power. They found that a pyroelectric coefficient of 8.2 can be achieved for deposits on PS, which is more than ~40 times higher than the one on Si substrate [17].…”

Section: Introductionmentioning

confidence: 98%

“…Additionally, a sensor based on ZnO/PSNW (zinc oxide on porous silicon nanowires) showed excellent gas sensing performance for various NO 2 concentrations (5-50 ppm), reaching a high electrical resistance rate of 35% for 50 ppm of NO 2 [16]. Furthermore, studies revealed a pyroelectric coefficient in ZnO/PS 40 times higher than in ZnO/c-Si and a pyroelectric voltage as high as 2.4 V [17].…”

Section: Introductionmentioning

confidence: 99%

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ZnO Deposition on Silicon and Porous Silicon Substrate via Radio Frequency Magnetron Sputtering

Morales-Morales,

Martínez-Ayala,

Jiménez-Vivanco

et al. 2023

Coatings

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Nanostructured Zinc Oxide (ZnO) was deposited on silicon (c-Si) and macroporous silicon (m-PS) using a radio frequency (RF) reactive magnetron sputtering technique. Two RF powers of 60 and 80 W were selected for ZnO deposition on the substrates. Furthermore, the c-Si and m-PS substrate temperatures were kept at 500 and 800 °C, respectively. The morphological, structural, and optical characteristics of the samples were studied using scanning electron microscopy (SEM), an X-ray diffractometer (XRD), X-ray photoelectron spectroscopy (XPS), and photoluminescence spectroscopy (PL). The SEM images revealed the formation of ZnO nanorods on the c-Si and ZnO nanostructures constituted by the assembly of nanorods. It has been found that the increasing RF sputtering power caused the rise in the residual stress. In addition, the increase in the deposition temperature caused an improvement in the arrangement of the crystals, which was attributed to the decrease in crystal defects.

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Section: Introductionmentioning

confidence: 98%

Section: Introductionmentioning

confidence: 99%

ZnO Deposition on Silicon and Porous Silicon Substrate via Radio Frequency Magnetron Sputtering

Morales-Morales,

Martínez-Ayala,

Jiménez-Vivanco

et al. 2023

Coatings

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“…The maximum voltage response was obtained for a line width of 30 μm and ZnO thickness of 1µm. Cieck et al [ 14 ] deposited ZnO thin films by RF&DC magnetron sputtering on silicon and porous silicon (PS) substrates for pyroelectric applications. Due to PS’s large internal area, low thermal conductivity, and preferred c -axis orientation, a pyroelectric coefficient of 8.2 could be achieved (about 40 times higher than that on silicon substrate).…”

Section: Introductionmentioning

confidence: 99%

Positioning System of Infrared Sensors Based on ZnO Thin Film

Tsai,

Lin,

et al. 2023

Sensors

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Infrared sensors incorporating suspended zinc oxide (ZnO) pyroelectric films and thermally insulated silicon substrates are fabricated using conventional MEMS-based thin-film deposition, photolithography, and etching techniques. The responsivity of the pyroelectric film is improved via annealing at 500 °C for 4 h. The voltage response of the fabricated sensors is evaluated experimentally for a substrate thickness of 1 µm over a sensing range of 30 cm. The results show that the voltage signal varies as an inverse exponential function of the distance. A positioning system based on three infrared sensors is implemented in LabVIEW. It is shown that the position estimates obtained using the proposed system are in excellent agreement with the actual locations. In general, the results presented in this study provide a useful source of reference for the further development of MEMS-based pyroelectric infrared sensors.

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“…For deposition of ZnO various physical and chemical methods, such as RF magnetron sput-tering [10,11], spray pyrolysis [12,13], chemical vapour deposition (CVD) [14], metal organic chemical vapour deposition (MOCVD) [5,15], sol-gel [16][17][18][19], chemical bath deposition (CBD) [20][21][22][23][24][25], successive ionic layer adsorption and reaction (SILAR) [20,[26][27][28] and atomic layer deposition (ALD) [29][30][31][32][33], have been used. Chemical methods are attractive because they are simple and do not require complicated expensive arrangements.…”

Section: Introductionmentioning

confidence: 99%

Formation of ZnO films using the SILAR method

Šimkūnaitė-Stanynienė¹,

Grincienė²,

Naruškevičius³

et al. 2019

chemija

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The thin ZnO films were deposited using the successive ionic layer adsorption and reaction (SILAR) method. The morphology, structure and composition of the thin ZnO films were examined using scanning electron microscopy (SEM), X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS). The optical properties of the thin ZnO layers, which were deposited onto glass substrates, were investigated using ultraviolet–visible spectrophotometry (UV/Vis). It was found that the optical properties of the ZnO films depend on the composition of anionic precursor solutions, which were used for deposition of the ZnO layers. Moreover, the highest band gap energy of 3.86 eV was obtained for the ZnO layer when the 0.026 mol l–1 Na2B4O7 + 0.002 mol l–1 KMnO4 solution was used as the anionic precursor solution for the deposition of ZnO layers.

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Deposition of ZnO thin films by RF&DC magnetron sputtering on silicon and porous-silicon substrates for pyroelectric applications

Cited by 9 publications

References 20 publications

ZnO Deposition on Silicon and Porous Silicon Substrate via Radio Frequency Magnetron Sputtering

ZnO Deposition on Silicon and Porous Silicon Substrate via Radio Frequency Magnetron Sputtering

Positioning System of Infrared Sensors Based on ZnO Thin Film

Formation of ZnO films using the SILAR method

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