2001
DOI: 10.1016/s0257-8972(01)01100-8
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Deposition rate and three-dimensional uniformity of RF plasma deposited SiOx films

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Cited by 60 publications
(38 citation statements)
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“…The absorption bands at 2965 and 1260 cm 21 can be assigned to CH 3 stretching and CH 3 deformation vibrations respectively. The large broad absorption band at 1020 cm 21 is due to the presence of Si-O-Si bonds, while the peak at 850 cm 21 can be attributed to Si-C and CH 3 rocking vibrations. The absorption band at 800 cm 21 is due to CH 3 rocking vibrations and Si-O-Si stretching vibrations.…”
Section: Fourier Transform Infrared Spectroscopy Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…The absorption bands at 2965 and 1260 cm 21 can be assigned to CH 3 stretching and CH 3 deformation vibrations respectively. The large broad absorption band at 1020 cm 21 is due to the presence of Si-O-Si bonds, while the peak at 850 cm 21 can be attributed to Si-C and CH 3 rocking vibrations. The absorption band at 800 cm 21 is due to CH 3 rocking vibrations and Si-O-Si stretching vibrations.…”
Section: Fourier Transform Infrared Spectroscopy Resultsmentioning
confidence: 99%
“…Hexamethyldisiloxane plasma-polymerised thin films can be assayed for a large number of applications in rather different fields such as protective anti-scratch coatings on plastic substrates, barrier films for food and pharmaceutical packaging, corrosion protection layers, coatings for biocompatible materials and low-k dielectric layers for microelectronic applications. [21][22][23] Tetramethyldisiloxane (TMDSO) is another organosilicon monomer with a structure closely related to HMDSO. Nevertheless this closely related structure, the use of TMDSO as monomer has been described less in literature, [24][25][26][27] although one can expect that this monomer could also lead to deposited layers with useful and interesting properties.…”
Section: Introductionmentioning
confidence: 99%
“…CH 4 is introduced through a shower head integrated in the upper, grounded electrode yielding a vertical gas flow towards the lower RF-driven electrode of the same size (A dep = 29 Â 39 cm 2 ). Both electrodes are part of the outer recipient separated by a 8.5 cm high, rectangular frame made of polycarbonate shielded inside with glass [16]. Thus, no bias voltage is produced and the plasma fills the whole vacuum chamber providing a defined geometry and well-defined plasma conditions.…”
Section: Methodsmentioning
confidence: 99%
“…The presence of a high concentration of methyl groups encourages the hydrophobic properties of the coating. Many studies have likewise observed a similar effect of power on wettability in a plasma polymerization process [65,146,147].…”
Section: ïV-3-optimization Of Plasma Process Parametersmentioning
confidence: 68%