2013
DOI: 10.1007/s11664-013-2659-z
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Depth Profiling of Electronic Transport Parameters in n-on-p Boron-Ion-Implanted Vacancy-Doped HgCdTe

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Cited by 24 publications
(12 citation statements)
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“…Photodetectors, part of the technical foundation of our information society, are widely used in communications, imaging, sensing and other applications [1]. Many different photodetectors, with different materials and structures, have been reported in recent years [2,3,4,5]. For these different photodetectors, the range of light detection depends on the light-absorbing materials, whose ability to absorb light is determined by their band structures.…”
Section: Introductionmentioning
confidence: 99%
“…Photodetectors, part of the technical foundation of our information society, are widely used in communications, imaging, sensing and other applications [1]. Many different photodetectors, with different materials and structures, have been reported in recent years [2,3,4,5]. For these different photodetectors, the range of light detection depends on the light-absorbing materials, whose ability to absorb light is determined by their band structures.…”
Section: Introductionmentioning
confidence: 99%
“…However, the lattice matched substrates with MCT as ZnCdTe are more expensive than III-V substrates and also the growing of MCT structures with low dislocation density on Si or GaAs as alternate substrates have some difficulties. 23 InGaAs along with HgCdTe (MCT) has also been extensively studied with a great potential for the infrared detector applications [24][25][26][27][28][29][30][31][32] such as metal-semiconductor-metal (MSM) photodetectors. [33][34][35] InGaAs detector performance agrees with that of MCT in the 1.5-3.7 lm wavelength range due to similar semiconductor band structures.…”
Section: Introductionmentioning
confidence: 99%
“…Planar n-on-p HgCdTe photovoltaic device with a photosensitive area of 100×100 μm 2 is prepared experimentally, and the device structure is shown in Figure 1(a), where the p-type HgCdTe material is a Hg vacancy-dominated epitaxial LPE thin-film material with a concentration of Na=1×10 18 cm -3 in the p-region. HgCdTe material is formed by epitaxially growing on the CdZnTe substrate in the (111) crystal direction [10,11] , where the n-region doping concentration Nd = 2×10 18 cm -3 is achieved by boron ion injection, and a lower doping concentration Nd = 1 × 10 15 cm -3 can be formed in the n-region by post-annealing treatment. The ZnS/CdTe passivation layer is grown on the surface of the device, which can be used as a barrier layer for ion injection to reduce the lattice damage to the material by injection, and effectively reduces the surface complexation of the device and reduces the surface dark current.…”
mentioning
confidence: 99%