Depth profiling studies of the surface directed phase decomposition in thin polymer films

Rysz, Jakub; Ermer, Hubert; Budkowski, Andrzej; Lekka, Małgorzata; Bernasik, Andrzej; Wróbel, S.; Brenn, R.; Lekki, Janusz; Jedliński, J.

doi:10.1016/s0042-207x(98)00483-7

Cited by 20 publications

(23 citation statements)

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“…In addition, the sputter rate is significantly reduced when employing atomic beams, such that only dynamic SIMS instruments are typically used. There are several examples of polymeric depth profiling with atomic beams including PS (Whitlow & Wool, 1989, 1991Zhao et al, 1991;Shwarz et al, 1992;Liu et al, 1995;Zheng et al, 1995;Strzhemechny et al, 1997;Rysz et al, 1999;Yokoyama et al, 1999;Shin et al, 2001;Hu et al, 2003;Lin et al, 2003;Harton, Stevie, & Ade, 2006a,b,c;Harton et al, 2006d), PAMA (Valenty et al, 1984), PBMA (Verhoeven et al, 2004), PEVA (Verhoeven et al, 2004), PC (Valenty et al, 1984), PVDF (Chujo, 1991), PEO (Mattsson et al, 2000;Huang et al, 2001), PMMA (Chujo, 1991;Huang et al, 2001;Hu et al, 2003;Harton, Stevie, & Ade, 2006a,b,c;Harton et al, 2006d), polydimethyl phenylene oxide (PDPO) (Lin et al, 2003), PVP (Zheng et al, 1995;Pinto, Novak, & Nicholas, 1999;Yokoyama et al, 1999;Harton, Stevie, & Ade, 2006a,b;Harton et al, 2006d), PPV and other polymer based LED materials Bulle-Lieuwma & van de Weijer, 2006), solar cell materials (Bulle-Lieuwma et al, 2003), conducting polymers (Gray et al, 1992), video tapes (Chujo, 1991), silicones …”

Section: B Atomic Ion Bombardment Of Polymersmentioning

confidence: 99%

Cluster secondary ion mass spectrometry of polymers and related materials

Mahoney

2009

Mass Spectrometry Reviews

283

329

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Cluster secondary ion mass spectrometry (cluster SIMS) has played a critical role in the characterization of polymeric materials over the last decade, allowing for the ability to obtain spatially resolved surface and in-depth molecular information from many polymer systems. With the advent of new molecular sources such as C(60)(+), Au(3)(+), SF(5)(+), and Bi(3)(+), there are considerable increases in secondary ion signal as compared to more conventional atomic beams (Ar(+), Cs(+), or Ga(+)). In addition, compositional depth profiling in organic and polymeric systems is now feasible, without the rapid signal decay that is typically observed under atomic bombardment. The premise behind the success of cluster SIMS is that compared to atomic beams, polyatomic beams tend to cause surface-localized damage with rapid sputter removal rates, resulting in a system at equilibrium, where the damage created is rapidly removed before it can accumulate. Though this may be partly true, there are actually much more complex chemistries occurring under polyatomic bombardment of organic and polymeric materials, which need to be considered and discussed to better understand and define the important parameters for successful depth profiling. The following presents a review of the current literature on polymer analysis using cluster beams. This review will focus on the surface and in-depth characterization of polymer samples with cluster sources, but will also discuss the characterization of other relevant organic materials, and basic polymer radiation chemistry.

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Section: B Atomic Ion Bombardment Of Polymersmentioning

confidence: 99%

Cluster secondary ion mass spectrometry of polymers and related materials

Mahoney

2009

Mass Spectrometry Reviews

283

329

View full text Add to dashboard Cite

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“…by exchanging polymers [51,56]) or ∆γ (e.g. by changing the chemical nature of the substrate [9,11] Approaches using mixed SAMs [67] or end-grafted random copolymer brushes [68], both with variable composition, were used to tune the effective interactions between polymers and the substrate. A controlled variation of both effective surface fields was achieved by adding surface-active copolymers to the mixtures [10,12,69].…”

Section: A Surface/polymers Interactions Tuned By Surface-active DImentioning

confidence: 99%

“…This occurs for surface excess values Γ > *Γ, that is when each diblock copolymer occupies an area smaller than that described by the block radius of gyration [10,12]. The onset volume fraction *φ separates two regimes of separated copolymer islands (φ PI-PS < *φ) and a continuous diblock copolymer layer (φ PI-PS > *φ), both reflected in experimentally detected characteristics such as segregation properties [4,73,74] or free surface morphology (prior to annealing) [11]. The concentrations of PI-PS copolymer additives were too low for the critical micelle concentration transition to occur [4,[73][74][75].…”

Section: A Surface/polymers Interactions Tuned By Surface-active DImentioning

confidence: 99%

“…1a). Self-stratification of thin films with initial compositional homogeneity, leading to a multilayer ordering, is the first [4,[10][11][12][13] of two main problems considered in the present paper. Phase separation in polymer mixtures is also altered by the presence of a pre-structured substrate with lateral pattern of surface energy [7,[14][15][16][17][18][19][20][21] (Fig.…”

Section: Introductionmentioning

confidence: 99%

“…the alignment of phase domains with respect to the patterned substrate (accompanied by free surface undulations), is the second main issue [19] discussed here. Selfassembly of polymer blends, cast as thin films on both homogeneous as well as patterned substrates, is a consequence of surface-directed phase separation [1,3,4,[9][10][11][12][13][23][24][25][26][27][28][29][30][31][32], discovered [23,27] only 10 years ago and described shortly below. Molecular mobility in the phase-separating films is promoted by the temperature elevated above glass transition (temperature quench applied for partly miscible or immiscible mixtures) or a common solvent added to the polymer blend (solvent quench encountered commonly for immiscible blends).…”

Section: Introductionmentioning

confidence: 99%

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Surface-directed phase separation in nanometer polymer films: self-stratification and pattern replication

et al. 2002

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Phase separation occurs in thin films of polymer blends when molecular mobility is promoted by a temperature above the glass transition but inside the twophase region (temperature quench), or a common solvent added to the polymers (solvent quench). This phenomenon can be altered by a homogeneous surface or pre-patterned substrate, resulting, e.g., in self-stratification or pattern replication, respectively. Such self-organisation processes ordering polymer phases were observed for model polymer blends (deuterated/hydrogenated polystyrene, dPS/hPS, and deuterated/partially brominated PS, dPS/PBrS, both with hPSpolyisoprene diblocks added; dPS/poly(vinylpyridine) and PBrS/PVP) with highresolution ion beam techniques (Nuclear Reaction Analysis, profiling and mapping mode of dynamic Secondary Ion Mass Spectrometry) and Atomic Force Microscopy. The self-stratification process is strongly affected by both the range as well as the strength of the surface/polymer interactions. This is illustrated for the temperature-quenched blends with surface-active copolymer additives tuning the interactions exerted by both external surfaces. The pattern transfer from the substrate to the films is demonstrated for the solvent-quenched blends. Patterndirected composition variations (SIMS maps) coincide with free surface undulations (AFM images). The most effective pattern replication is achieved for the length scale of phase domain morphology comparable with the pattern periodicity and for carefully adjusted polymer/substrate interactions.

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