Depth Profiling Using Reflected Electron Spectroscopy

Афанасьев, В. П.; Bodisko, Yu. N.; Gryazev, A. S.; Kaplya, P. S.; Fedorovich, S. D.

doi:10.1134/s1027451018050531

Cited by 4 publications

(1 citation statement)

References 15 publications

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“…Among them, ARXPS and RES as non-destructive methods can give overall chemical information with the probing depth of 1–4 nm. 9,10 However, both methods require a very flat surface of the sample, the rough or nanostructured surfaces are not applicative because of the shadowing effect. Moreover, the probing depth for two methods is just 1–4 nm, limiting their application in material analysis.…”

Section: Introductionmentioning

confidence: 99%

XPS depth profiling of functional materials: applications of ion beam etching techniques

Li,

Chen,

Zhou

et al. 2024

Mater. Chem. Front.

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Section: Introductionmentioning

confidence: 99%

XPS depth profiling of functional materials: applications of ion beam etching techniques

Li,

Chen,

Zhou

et al. 2024

Mater. Chem. Front.

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Investigation of monolayer and submonolayer films using X-ray photoelectron spectroscopy

Афанасьев

Selyakov

Ridzel

et al. 2020

J. Phys.: Conf. Ser.

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A method of layer thickness determination by X-ray photoelectron spectroscopy (XPS) is analyzed. Angle-resolved XPS spectra measured for three samples (gold films of different thicknesses located on top of silicon substrates) have been interpreted by the straight line approximation (SLA) model. Two configurations of films were considered: (i) a flat surface of a semi-infinite layer (substrate) is covered with a flat homogeneous layer, (ii) coating constitutes an island (cluster) structure. It is shown that the simplest model of an island coating makes it possible to qualitatively explain the effect of decreasing of the effective average coating thickness observed in the angle-resolved XPS experiments.

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Effect of nanocoating morphology on the signal of X-ray Photoelectron Spectroscopy

Афанасьев

Lobanova

Selyakov

et al. 2021

J. Phys.: Conf. Ser.

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The paper considers the application of the traditional X-ray photoelectron spectroscopy (XPS) methodology: the Overlayer Thickness Determination for the analysis of coating parameters. In particular situations considered in this work, it is energetically favorable for the atoms of the coating to form clusters, but not be evenly distributed on the surface of the substrate material. The change in the XPS signal is analyzed in situations when the coating is not a plane-parallel homogeneous layer, but an island (cluster) structure. The mathematical model of the XPS signal formation is considered for the case of the cluster covering in the form of parallelepipeds. Photoelectron path distributions (in the coating material) analysis indicated a strong dependence of the signal on the viewing angle. For the purpose of analysis, experimental spectra were obtained for several samples: gold depositions of various thicknesses on a silicon substrate. The spectra were measured for different viewing angles of photoelectrons and interpreted within the Straight Line Approximation (SLA). It is shown that proposed simplest model of an island coating allows to describe the effect of a decrease in the value of the effective average coating thickness, determined in plane-parallel geometry, with an increase in the viewing angle, observed in XPS experiments with angular resolution.

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Depth Profiling Using Reflected Electron Spectroscopy

Cited by 4 publications

References 15 publications

XPS depth profiling of functional materials: applications of ion beam etching techniques

XPS depth profiling of functional materials: applications of ion beam etching techniques

Investigation of monolayer and submonolayer films using X-ray photoelectron spectroscopy

Effect of nanocoating morphology on the signal of X-ray Photoelectron Spectroscopy

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