1991
DOI: 10.1149/1.2085878
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Design and Verification of Nearly Ideal Flow and Heat Transfer in a Rotating Disk Chemical Vapor Deposition Reactor

Abstract: A research chemical vapor deposition reactor design is presented for a rotating disk configuration. The reactor can be operated under conditions such that nearly ideal, one-dimensional, infinite-radius disk behavior is achieved over most of the disk surface. Boundary conditions, flow stability under both isothermal and heated-disk conditions, and gas temperatures are addressed with both one-and two-dimensional numerical fluid mechanics models. Experimental verification of the design using flow visualization an… Show more

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Cited by 92 publications
(42 citation statements)
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“…It is an important engineering application where transitions from stable to unstable (and undesirable) flows have been seen experimentally [2]. The flow stability problem is complex because of competing flow effects due to forced convection at the inlet of the reactor, rotationally-driven convection at a spinning disk in the reactor, and buoyancydriven flow due to large temperature gradients.…”
Section: Numerical Experiments and Discussionmentioning
confidence: 99%
“…It is an important engineering application where transitions from stable to unstable (and undesirable) flows have been seen experimentally [2]. The flow stability problem is complex because of competing flow effects due to forced convection at the inlet of the reactor, rotationally-driven convection at a spinning disk in the reactor, and buoyancydriven flow due to large temperature gradients.…”
Section: Numerical Experiments and Discussionmentioning
confidence: 99%
“…The susceptor is rotated at 1200 rpm. The rotating speed in combination with the reactor pressure and susceptor temperature determine the total gas flow rate required to maintain a matched flow pattern [9]. Flow rates of TMGa and NHS are kept at 130pmol/min and 6.0slm respectively to give a high temperature growth rate of approximately 2.3pm/hr.…”
Section: Methodsmentioning
confidence: 99%
“…The high speed rotating disk design has been demonstrated analytically and experimentally to provide excellent uniformity. 64,65 Both reactor designs are theoretically scalable to any size wafer platter. Uniform deposition of BST films has been demonstrated in both planetary 66 and high speed rotating disk MOCVD reactors.…”
Section: E Mocvdmentioning
confidence: 99%