2015
DOI: 10.1007/s10470-014-0485-8
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Design, microfabrication and analysis of polysilicon thin layers for MEMS vibrating structures

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Cited by 9 publications
(2 citation statements)
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“…The reason may be related to surface lattice misalignment caused by different dopants, larger atomic mismatch and slower grain growth associated with boron doped substrates. 26 The possible explanation is that during the high-temperature deposition process, a significant amount of boron atoms from the heavily doped substrate diffuse into the interior of the polysilicon film. Considering the atomic radii of boron (0.087 nm) and arsenic (0.114 nm), compared to silicon's radius of 0.112 nm, there is a significant mismatch between boron and silicon (0.22), while the mismatch between arsenic and silicon is relatively small (0.02).…”
Section: Resultsmentioning
confidence: 99%
“…The reason may be related to surface lattice misalignment caused by different dopants, larger atomic mismatch and slower grain growth associated with boron doped substrates. 26 The possible explanation is that during the high-temperature deposition process, a significant amount of boron atoms from the heavily doped substrate diffuse into the interior of the polysilicon film. Considering the atomic radii of boron (0.087 nm) and arsenic (0.114 nm), compared to silicon's radius of 0.112 nm, there is a significant mismatch between boron and silicon (0.22), while the mismatch between arsenic and silicon is relatively small (0.02).…”
Section: Resultsmentioning
confidence: 99%
“…For the micro-/nano-pattern fabrication, the photolithography [ 9 , 22 , 23 ] and the electron beam lithography (EBL) [ 17 , 24 ] are the most used techniques. EBL provides good patterning results for nanoscale features (called “direct writing technique”).…”
Section: Introductionmentioning
confidence: 99%