Design of a high-numerical-aperture extreme ultraviolet lithography illumination system

Pupil energy balances have always been considered significant elements for emersion lithography generally due to the large angle of incidence and offset imaging field. Those imbalances impact on exposure uniformity and decay pattern resolution. To overcome such shortcomings, a study on pupil compensation is discussed in this manuscript. A computational method based on a constrained optimization solution is proposed. By using a self-designed optical model of a zoomed system incorporating axicon lenses, a series of computations are developed and discussed. Also, the validity of our compensation method has been fully verified by simulations under multiple illumination settings.

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Constrained pupil balance compensation for specific lithographic illuminator settings

Rui

Yang

2020

Appl. Opt.

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Design of an illumination system for high numerical aperture anamorphic extreme ultraviolet projection lithography

Hao

Liu

et al. 2021

Opt. Express

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The illumination system design for high numerical aperture (NA) anamorphic objectives is a key challenge for extreme ultraviolet lithography. In this paper, a reverse design method of the off-axis mixed-conic-surface-type relay system and an automatic arrangement method of field facets are proposed to design a high NA anamorphic illumination system. The two off-axis relay mirrors are fitted into different conic surfaces based on the conjugation of the mask plane and field facet and that of the illumination exit pupil and pupil facet. To eliminate ray obscuration between neighboring field facets, the field facets are automatically arranged according to the distances that are determined by the relative tilt angles of neighboring field facets under the current illumination mode. The proposed methods are applied in the design of an illumination system matching the NA0.60 anamorphic objective. Simulation results show that the uniformity of the scanning energy distribution can reach 99% on the mask plane under different illumination modes.

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Optical system design of double-sided telecentric microscope with high numerical aperture and long working distance

Zhang

Sun

et al. 2023

Opt. Express

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The working distance of the high numerical aperture visible video microscope is extremely short, which greatly limits its application scenarios. To solve this problem, this paper proposes an unobstructed design method of double-sided telecentric microscope with high numerical aperture and long working distance. First, aiming at the obstruction problem of the image-side telecentric catadioptric microscope objective, the structure of the catadioptric optical system is improved. Then, the aspheric design method based on the best aberration compensation is analyzed theoretically to better correct the primary aberration of the high-numerical aperture microscope objective. Finally, a double-sided telecentric microscope optical system with a numerical aperture (NA) of 0.8 and a working distance of 10.0 mm was designed, which is composed of a spherical reflector, a beam splitter plate, a collimating lens group, and an image-side telecentric eyepiece optical system. The design results show that the imaging resolution of this high numerical aperture video microscope is as high as 0.42 µm, and the microscope has a magnification of about 220× for the image with 1080P (1920 × 1080 pixels) resolution. This double-sided telecentric microscope has the advantages of a large field of view, compact structure, good stray light suppression ability, and manufacturability, and has high practical value in the field of high-precision measurement and detection.

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Design of a high-numerical-aperture extreme ultraviolet lithography illumination system

Cited by 5 publications

References 10 publications

Constrained pupil balance compensation for specific lithographic illuminator settings

Constrained pupil balance compensation for specific lithographic illuminator settings

Design of an illumination system for high numerical aperture anamorphic extreme ultraviolet projection lithography

Optical system design of double-sided telecentric microscope with high numerical aperture and long working distance

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