2011
DOI: 10.1016/j.mejo.2010.08.004
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Design of a RF matching network based on a new tunable inductor concept

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Cited by 9 publications
(2 citation statements)
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“…Magnetoelectric coupling shows great promise for achieving tunable devices 15 16 17 18 19 where the impedance in a specific frequency range can be changed according to the input signal. Recently, such devices need to operate in a wide frequency band that includes both digital and analogue broadcasts.…”
mentioning
confidence: 99%
“…Magnetoelectric coupling shows great promise for achieving tunable devices 15 16 17 18 19 where the impedance in a specific frequency range can be changed according to the input signal. Recently, such devices need to operate in a wide frequency band that includes both digital and analogue broadcasts.…”
mentioning
confidence: 99%
“…The impedance matching between an RF generator and a plasma chamber is an integral factor in RF systems to maximize RF power absorbed in plasma, lessen inadequate damage to equipment such as a RF generator and matching components, and maintain processing reproducibility and stability. Various impedance matching networks and algorithms for a wide-range and high-speed matching performance have been developed for lots of plasma sources such as real-time matching for pulsed and continuous wave plasma sources [6][7][8][9][10][11]. Especially, a wide range of impedance matching techniques have received a lot of attention because of industrial needs in order to cover various optimum plasma processing windows (condition) by using a few matching equipment.…”
Section: Introductionmentioning
confidence: 99%