2004
DOI: 10.1088/1742-6596/2/1/007
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Design of EBIS for nanoprocesses using HCI

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Cited by 8 publications
(3 citation statements)
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“…The design and performance of the EBIS is described elsewhere [9,10]. The electron beam (16keV, 80mA) was compressed in the drift tube of the EBIS by 3T magnetic field generated by a superconducting magnet cooled by a closed-cycle refrigerator.…”
Section: Methodsmentioning
confidence: 99%
“…The design and performance of the EBIS is described elsewhere [9,10]. The electron beam (16keV, 80mA) was compressed in the drift tube of the EBIS by 3T magnetic field generated by a superconducting magnet cooled by a closed-cycle refrigerator.…”
Section: Methodsmentioning
confidence: 99%
“…The detail of design and performance is described elsewhere [5]. The other is an electron beam ion source (EBIS) recently developed at Kobe University, which is designed for the application of ion beam processing of materials so that it is constructed and operated easily without demanding expertise of EBIS using a separate, commercially available super-conducting (SC) magnet [6]. Maximum values of electron beam energy and electron current are 40keV and 300mA, respectively.…”
Section: Introductionmentioning
confidence: 99%
“…We note on improvements performed on the design structure shown in the earlier publications [6][7][8] in order to achieve target specifications. We found some errors in the calculation of magnetic field distribution, which revealed magnetic shields at electron gun and collector did not function sufficiently, then the electron gun was moved away from the SC magnet by 9cm and the magnetic shield at collector was reconstructed with thicker shield structure and stronger ceramic supports.…”
Section: Introductionmentioning
confidence: 99%