“…A Ni stamper had line-and-space patterns with a ridge width of 30 nm, a depth of 58 nm, and pitches of 90 nm, 120 nm, 150 nm, 200 nm, and 320 nm, i.e., trench widths of 60 nm, 90 nm, 120 nm, 170 nm, and 290 nm, respectively. The shape of these patterns has been described in detail in the previous work [13]. The materials used were polycarbonate (PC, AD-5503; Teijin Chemicals Ltd.; glass transition temperature (T g ): 145 °C) and cycloolefin polymer (COP, ZENOR1060R; ZEON CORPORATION; T g : 100 °C).…”