Design of Polarization-Independent and Wide-Angle Broadband Absorbers for Highly Efficient Reflective Structural Color Filters

Lee, Kyu‐Tae; Kang, Daeshik; Park, Hui Joon; Park, Dong Hyuk; Han, Seungyong

doi:10.3390/ma12071050

Cited by 15 publications

(6 citation statements)

References 40 publications

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“…Constructive and destructive interferences happen as a result of light reflected off the top and bottom interfaces of the cavity. The thickness of the cavity needs to be adjusted to fit integer multiples of half wavelengths for constructive interference, leading to peaks in transmittance or absorptance. − …”

Section: Structural Color Generation Methods and Relevant Applicationsmentioning

confidence: 99%

Nanophotonic Structural Colors

et al. 2020

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Structural colors traditionally refer to colors arising from the interaction of light with structures with periodicities on the order of the wavelength. Recently, the definition has been broadened to include colors arising from individual resonators that can be subwavelength in dimension, e.g., plasmonic and dielectric nanoantennas. For instance, diverse metallic and dielectric nanostructure designs have been utilized to generate structural colors based on various physical phenomena, such as localized surface plasmon resonances (LSPRs), Mie resonances, thin-film Fabry-Pérot interference, and Rayleigh-Wood diffraction anomalies from 2D periodic lattices and photonic crystals. Here, we provide our perspective of the key application areas where structural colors really shine, and other areas where more work is needed. We review major classes of materials and structures employed to generate structural coloration and highlight the main physical resonances involved.

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Section: Structural Color Generation Methods and Relevant Applicationsmentioning

confidence: 99%

Nanophotonic Structural Colors

et al. 2020

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“…Up to now, structural colors have been applied in photoelectric sensors, [ 2,3 ] optical display devices, [ 4 ] anti‐counterfeiting films, special printing, light‐emitting diodes, and other fields. [ 5 ] Various technologies are used by researchers to realize structural colors, including two‐dimensional grating coupled resonance, [ 6–9 ] perfect absorber, [ 10–12 ] guided‐mode resonance, [ 13 ] plasmon resonance, [ 14–18 ] Fabry–Perot structure, [ 19–21 ] etc. These techniques often require nanoscale grating, which requires a series of complex and expensive photolithography, etching, and other processes.…”

Section: Introductionmentioning

confidence: 99%

Symmetric Thin Films Based on Silicon Materials for Angle‐Insensitive Full‐Color Structural Colors

Feng

Liu

et al. 2022

Adv Materials Technologies

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expensive photolithography, etching, and other processes. [22] Photonic crystal thin film interference technology provides a new solution. [23][24][25][26] The structural color based on photonic crystal technology does not require complex photolithography, etching and other steps, so it has significant advantages in preparation, cost, efficiency, and other aspects. This is also one of the important technologies that can be put into large-scale industrial production at present. The structural color based on thin film is usually achieved by successively depositing materials with different refractive indexes. The final thin films can present specific colors based on the multi-beam interference. When the structure, period number and thickness of the thin film change, the color of the photonic crystal thin film will also change. However, one problem of this technology is that the change of the incident angle leads to the change of the equivalent optical path, so that the reflection spectrum of the device will drift with the angle. This phenomenon of the color changing with angle limits the application of structural color.In recent years, a large amount of research discussed the angle insensitive structural colors. For example, Yang et al. used metals such as Al, W, Ge, Au, Ni, and the dielectric material Ta 2 O 5 to produce high-purity RGB reflective colors. [27] Lee et al. achieved transmitted structural colors with high efficiency and high color purity by using dielectric materials (ZnS) and metal (Ag). [28] Transmission peaks of the three colors (red, blue, and green) are between 50% and 70%, and it also has good angle insensitivity. By this means, various applications may be possible such as wearable displays, flexible electronics, image sensors, and decorations. However, using non-metallic materials to achieve angle insensitive structural color is also a great challenge. Meanwhile, the research on cyan, magenta, yellow (CMY) reflective structural colors with high reflection efficiency and high angle sensitivity is still not mature. Especially in recent years, due to stable color appearance, structural color has been applied more and more in coating, car paint, color printing, and other fields. [29][30][31][32][33][34][35][36] Structural color can present stable aesthetic color, therefore the study of CMY reflection color becomes more important. One problem that needs to be solved in this type of application is that the reflective colors on the front and back of the thin film need to be consistent. When solving this problem, it is often necessary to symmetrize the asymmetric Here, reflective full-color structural colors with symmetrical thin film structures made from all silicon-based materials are demonstrated. Considering practical application scenarios, the five-layer reflection enhancement unit located in the core of the device is composed of amorphous silicon (a-Si) and SiO 2 . Because of the large refractive index difference, the high reflection efficiency can be achieved, and the highest peak reflectivity o...

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“…Fabry–Perot cavity colors are strongly dependent on the cavity length (i.e., the thickness of the PMMA layer). − Therefore, the colors from an optical micrograph can be utilized to determine film thickness and structure height as was done by image analysis and corroborated by atomic force microscopy (AFM) measurements. Ultimately, our method can be employed to directly obtain structure height information on these samples by optical measurements, eliminating the need to carry out AFM measurements.…”

Section: Introductionmentioning

confidence: 99%

Direct Color Printing with an Electron Beam

Rezaei

Wang

et al. 2020

Nano Lett.

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The direct patterning of colors using the bombardment of a focused beam of electrons onto a thin-film stack consisting of poly(methyl methacrylate) coated with a thin nickel film is demonstrated. This direct electron-beam color printing approach creates variations in the height of a Fabry−Perot (FP) cavity, resulting directly in a color print without the need for prepatterned substrates, distinct from some direct laser writing methods. Notably, the resolution of the color prints is defined by the electron beam. Height measurements with ∼5 nm accuracy through color image analysis of an electron-beam-patterned FP cavity were carried out. This technique also introduces a reflectance-based measurement of the point exposure function of a focused electron beam, aiding in rapid proximity effect corrections. In addition, the grayscale lithographic nature of this process was used to produce blazed gratings and could enable the fabrication of other 2.5D nanostructures with precise height control.

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Design of Polarization-Independent and Wide-Angle Broadband Absorbers for Highly Efficient Reflective Structural Color Filters

Cited by 15 publications

References 40 publications

Nanophotonic Structural Colors

Nanophotonic Structural Colors

Symmetric Thin Films Based on Silicon Materials for Angle‐Insensitive Full‐Color Structural Colors

Direct Color Printing with an Electron Beam

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