“…Novel metal nanostructures are generally produced via conventional nanofabrication approaches, for instance, extreme UV Lithography [9,10], Focus Gallium Ion Beam Milling [11,12], and E-Beam Exposure Lithography [13,14]. While these techniques can produce nanostructures with a well-controlled size, shape, and alignment, they need costly facilities, stringent processes, and cannot address the problem of low throughput.…”