The different types of compositional inhomogeneities in ternary alloys of III-nitrides play an important role in the functioning of optoelectronics and electronic devices based on these materials. The fast development of highly efficient light-emitting diodes (LEDs) based on InGaN/GaN quantum-well (QW) structures was mainly determined by the inhomogeneous In distribution in the wells, which leads to the formation of a potential relief with local minima that localize charge carriers (localization states). As a result, this increases the quantum yield due to suppressing the lateral transport of charge carriers to such nonradiative recombination centers as threading dislocations. [1] Fluctuations in the In content in InGaN alloys are determined mainly by the thermodynamic instability of this compound at an InN mole concentration above %8À20 mol%, which results in the development of phase separation. [2,3] In addition, the compositional inhomogeneities in InGaN layers and QWs are determined by indium incorporation and its segregation effect. [4] Binary and ternary (Al,Ga)N compounds are basic materials for ultraviolet (UV) optoelectronics and high-power/frequency devices with numerous applications in various fields. [5][6][7][8] AlGaN layers also exhibit compositional inhomogeneities and ordering in a wide range of different scales from 1 monolayer (ML) to several tens of nanometers. The ordering has been observed in AlGaN layers grown by plasma-assisted molecular beam epitaxy (PA MBE) or metalÀorganic chemical vapor deposition (MOCVD). [9][10][11][12] Already in the first papers published by Moustakas's group, a strong dependence of the ordering on the PA MBE stoichiometric conditions, determined by III/N flux ratio, was found. [13][14][15] A systematic study of this phenomenon by different groups using both technologies revealed a wide range of ordering from a simple bilayer (1:1) period to much longer, up to 12 ML and even 30-40 nm or incommensurate periods. [16][17][18][19][20]