Determination of certain sol-gel growth parameters of nickel oxide films

Effect of plasma oxidation parameters on physical properties of nanocrystalline nickel oxide thin films grown by two-step method: DC sputtering and plasma oxidation

“…It is found that from the figures, the deduced band gap energy of NiO films are in range of 3.20-3.51 eV. The band gap value of the NiO films obtained in the present work closely matches with the value reported by many authors [8,11,14,[20][21][22][23].…”

“…Based on the XRD results we can observe that plasma oxidation of nickel films to be able to generate a good quality nanocrystalline NiO films without any annealing or substrate temperatures, which is an advantage of this techniques compared to other published works. The average crystallite size (D) of the NiO films was calculated for (111) peak by Debye-Scherrer's formula [23].…”

“…Some applications of NiO thin films include gas sensors [1][2][3][4][5], positive electrode in Li-ion batteries [9], electrochromic display devices [12] and metal-isolator-metal tunnel junction diode [11]. NiO films can be fabricated by different physical and chemical deposition techniques such as DC and RF magnetron sputtering [2,6,[11][12][13][14][15], thermal oxidation [16][17][18], chemical deposition [19,20], pulsed laser deposition [9], spray pyrolysis [21] and sol-gel [23]. An alternative method for preparation of NiO films that recently was reported by our research group is plasma oxidation of nickel thin films [7].…”

The influence of Y contribution on crystallographic, topographic and optical properties of ZnO: A heterojunction diode application

“…The sol-gel spin coating is a very appropriate thin film fabrication technique owing to its low costs, simplicity [29], the capacity of homogenous film production [30], and easy intervention [31]. Therefore, in this investigation, pure and Y incorporated ZnO samples were firstly grown on micro slide glasses via sol-gel spin coating and Y contribution influence on microstructural, topographic and optical characteristics of ZnO have been examined.…”

Optical, Physical, Chemical and Electrical Properties of Nickel Oxide Sprayed Thin Films under Tin Doping Effects

“…NiO thin films have been prepared by various methods such as sputtering [18,19], sol gel [20], pulsed laser deposition [21,22], chemical vapor deposition [23,24], and spray pyrolysis [25,26]. Among these techniques, spray pyrolysis is the widely used; it is an attractive process to obtain thin films which requires low cost raw materials, adherent of deposits, very easy, safe and cheap.…”