Determination of the critical thickness and the sensitivity for thin-film analysis by total reflection X-ray fluorescence spectrometry

Klockenkämper, R.; Bohlen, Alex von

doi:10.1016/0584-8547(89)80051-5

Cited by 129 publications

(72 citation statements)

References 3 publications

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“…The addition of the non-ionic surfactant allowed for the preparation of a smear that would most likely fall within the critical thickness for the given matrix. [31] Measurements were thus made of thin smears of lipstick that were modified so as to contain a homogeneously dispersed internal standard.…”

Section: Resultsmentioning

confidence: 99%

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The quantification of total lead in lipstick specimens by total reflection X-ray fluorescence spectrometry

2015

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aLipstick is known to contain lead, and this has been a general area of concern. Methods of quantifying lead in lipstick currently require the use of rather harsh digestion procedures given that lipstick specimens are high in their lipid content and contain many refractory materials. A simple method of performing lead analysis in lipstick specimens based on total reflection X-ray fluorescence spectrometry (TXRF) is presented here. Samples were prepared by melting lipstick specimens along with a non-ionic surfactant and an yttrium internal standard followed by homogenization. Solid prepared samples were then finely streaked directly onto a quartz reflector, and TXRF measurements made for 900-s live time. The method was found to produce a mean limit of detection for lead of 0.04 g/g. Precisions were found to be on the order of 11-38% relative standard deviation (RSD) and apparent recoveries for lead between 92% and 106% (n D 8). Although the spreading technique may result in thickness variations that may contribute to the higher than expected variances about the determined lead concentrations, the method presented in this work does show promise as a means of performing routine lead analysis in lipstick specimens without the need for harsh digestion procedures.

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Section: Resultsmentioning

confidence: 99%

“…The determination of the concentration of a given analyte, C i , was accomplished through Eqn (1), [30,31] …”

Section: Spectral Processing and Quantificationmentioning

confidence: 99%

The quantification of total lead in lipstick specimens by total reflection X-ray fluorescence spectrometry

2015

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“…An important factor for both TXRF and GEXRF is the critical thickness above which the advantages of total reÑection are lost because of increased matrix e †ects ; values for di †erent sample types were described by Klockenka mper and von Bohlen. 8 The accuracy of an XRF analysis is mainly determined by the matrix e †ects. Since none of the techniques have negligible matrix e †ects, control of extraneous additions and of losses before or during the measurement step also determine the accuracy of trace element analysis at the lg g~1 level.…”

Section: Comparison Of Xrf Techniques For Trace Element Analysismentioning

confidence: 99%

“…A precondition is that the sample must be present as a very thin layer, otherwise the principle of total reÑection will be lost. 8 Owing to these operational conditions, the matrix e †ects of conventional XRF cannot occur and a simple calibration by internal standardization can be performed.9 Normally, measurements in TXRF are performed in ambient air. For the detection of low-Z elements, however, a vacuum chamber is necessary (to reduce absorption) and a special energy-dispersive Ge(HP) detector is used that meets all requirements for low-energy detection, such as a 0.4 lm thick diamondlike carbon window, an ion-implanted contact layer, a thin dead layer and reduced electronic noise contributions.…”

Section: Introductionmentioning

confidence: 99%

Comparison of Grazing Emission XRF with Total Reflection XRF and Other X-Ray Emission Techniques

1997

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“…The extinction depth corresponds to the depth from which the emitted fluorescence intensity is attenuated by a factor of e −1 on the way from the fluorescence atom to the surface, whereas the critical thickness corresponds to the depth region for which absorption effects for the incident and emitted radiation can be safely neglected [81]. This restriction for the linear regime of calibration curves was first discussed for TXRF [82].…”

Section: Gixrf and Gexrfmentioning

confidence: 99%

High-energy-resolution grazing emission X-ray fluorescence applied to the characterization of thin Al films on Si

Kayser

Szlachetko

Banaś

et al. 2013

Spectrochimica Acta Part B: Atomic Spectroscopy

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The grazing emission X-ray fluorescence (GEXRF) technique was applied to the analysis of different Al films, with nominal thicknesses in the range of 1 nm to 150 nm, on Si wafers. In GEXRF the sample volume from which the fluorescence intensity is detected is restricted to a near-surface region whose thickness can be tuned by varying the observation angle. This is possible because of the refraction of the fluorescence X-rays and the quite long emission paths within the probed sample. By recording the X-ray fluorescence signal for different shallow emission angles, defined relatively to the flat, smooth sample surface, the deposited Al surface layers of the different samples could be well characterized in terms of layer thickness, layer density, oxidation and surface roughness. The advantages offered by synchrotron radiation and the employed wavelength-dispersive detection setup were profited from. The GEXRF results retrieved were confirmed by complementary measurements. The experimental setup, the principles and advantages of GEXRF and the analysis of the recorded angular intensity profiles will be discussed in details.

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Determination of the critical thickness and the sensitivity for thin-film analysis by total reflection X-ray fluorescence spectrometry

Cited by 129 publications

References 3 publications

The quantification of total lead in lipstick specimens by total reflection X-ray fluorescence spectrometry

The quantification of total lead in lipstick specimens by total reflection X-ray fluorescence spectrometry

Comparison of Grazing Emission XRF with Total Reflection XRF and Other X-Ray Emission Techniques

High-energy-resolution grazing emission X-ray fluorescence applied to the characterization of thin Al films on Si

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