2022
DOI: 10.1364/oe.477102
|View full text |Cite
|
Sign up to set email alerts
|

Determination of the nonlinear thermo-optic coefficient of silicon nitride and oxide using an effective index method

Abstract: There is little literature characterizing the temperature-dependent thermo-optic coefficient (TOC) for low pressure chemical vapor deposition (LPCVD) silicon nitride or plasma enhanced chemical vapor deposition (PECVD) silicon dioxide at temperatures above 300 K. In this study, we characterize these material TOC’s from approximately 300-460 K, yielding values of (2.51 ± 0.08) · 10−5K−1 for silicon nitride and (5.67 ± 0.53) · 10−6K−1 for silicon oxide at room temperature (300 K). We use a simplified experimenta… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2

Citation Types

1
1
0

Year Published

2023
2023
2024
2024

Publication Types

Select...
5

Relationship

0
5

Authors

Journals

citations
Cited by 8 publications
(2 citation statements)
references
References 25 publications
1
1
0
Order By: Relevance
“…Our measured TO-coefficient for LPCVD-SiN is within 5% of the values reported in Refs. 9 and 24; the excellent agreement with LPCVD-SiN literature values (Table 1) indicates that our setup enables accurate control of the sample temperature. We find a larger discrepancy for the SiO2 TO-coefficient (e.g., dnSiO2/dT=0.95×105/°C 9 and dnSiO2/dT=0.57×105/°C 24 ), which we attribute to the different oxides used in our sample in which the bottom SiO2 is thermal and the top SiO2 is PECVD-deposited.…”
Section: Low-loss Sin Platformsupporting
confidence: 77%
See 1 more Smart Citation
“…Our measured TO-coefficient for LPCVD-SiN is within 5% of the values reported in Refs. 9 and 24; the excellent agreement with LPCVD-SiN literature values (Table 1) indicates that our setup enables accurate control of the sample temperature. We find a larger discrepancy for the SiO2 TO-coefficient (e.g., dnSiO2/dT=0.95×105/°C 9 and dnSiO2/dT=0.57×105/°C 24 ), which we attribute to the different oxides used in our sample in which the bottom SiO2 is thermal and the top SiO2 is PECVD-deposited.…”
Section: Low-loss Sin Platformsupporting
confidence: 77%
“…Although Refs. 9 and 24 also report thermal and PECVD-SiO2, the PECVD deposition parameters likely result in substantially different material properties including TO-coefficients. Nonetheless, our measurements give an accurate baseline TO tuning coefficient for the LPCVD-SiN/SiO2-cladded waveguides, which we improve upon via polymer post-processing.…”
Section: Low-loss Sin Platformmentioning
confidence: 99%