“…In order to reduce the defect density, an GaN or MgO interlayer has been used [9,10] to decrease the lattice mismatch. Very recently, a surface modification technique of sapphire substrate using an ultrathin Ga wetting layer has been developed to obtain high-quality ZnO film, and a dramatic defect reduction is achieved [11,12]. In this study, the defect nature in the ZnO film prepared by this method is investigated by transmission electron microscopy (TEM) and X-ray diffractometry (XRD) compared to the ZnO film without the Ga wetting layer, aims to characterize the role of the Ga layer in the defect reduction and inversion domain suppression.…”