1968
DOI: 10.1107/s056773946800094x
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Determination of thermal expansion of germanium, rhodium and iridium by X-rays

Abstract: The lattice parameters of germanium, rhodium, and iridium were measured with a Unicam 19 cm high-temperature powder camera; the following equations represent the results:

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Cited by 174 publications
(77 citation statements)
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“…1(b)), which is close to the experimental one of 0.74 eV at 0 K. 16 Furthermore, the electronic structure predicted by the GGA þ U approach is consistent with the hybrid functional approach HSE06 (indirect band gap of 0.85 eV). The lattice parameter of an optimized unit cell was found to be 5.59 Å in good agreement with the experimental value of 5.66 Å , extrapolated to 0 K. 17 Figure 2 represents the formation energies of the V, PV, AsV, and SbV for various charge states. The doubly negatively charged vacancy, V À2 , is dominant for intrinsic and n-type doping conditions in agreement with experiment.…”
supporting
confidence: 60%
“…1(b)), which is close to the experimental one of 0.74 eV at 0 K. 16 Furthermore, the electronic structure predicted by the GGA þ U approach is consistent with the hybrid functional approach HSE06 (indirect band gap of 0.85 eV). The lattice parameter of an optimized unit cell was found to be 5.59 Å in good agreement with the experimental value of 5.66 Å , extrapolated to 0 K. 17 Figure 2 represents the formation energies of the V, PV, AsV, and SbV for various charge states. The doubly negatively charged vacancy, V À2 , is dominant for intrinsic and n-type doping conditions in agreement with experiment.…”
supporting
confidence: 60%
“…A single domain extends over several monatomic steps, indicating the high quality of the h-BN layer as it extends over step edges in a carpetlike fashion [24,32,33]. The moiré superstructure due to the lattice mismatch (Ir(111): a = 2.714Å [34] and h-BN: a = 2.505Å [35]) is highlighted in Fig. 1(b); it is formed by depressions arranged in a hexagonal lattice.…”
Section: Resultsmentioning
confidence: 99%
“…The coefficient of thermal expansion for Ge is approximately one order of magnitude less than a composition-averaged value for SHTO alloys [26][27][28] ; over the 500-650°C annealing window the x-value that matches the Ge separation distance decreases from x ∼ 0.4 to x ∼ 0.3. We sought to determine how interface strain influenced crystallization.…”
Section: Deposition and Crystallization Of Shf X Ti 1−x O 3 Filmsmentioning
confidence: 99%