Determination of Ultratrace Impurities in High Purity Tantalum Materials by On-line Anion Exchange Matrix Separation and Inductively Coupled Plasma Mass Spectrometry

Kozono, Shuji; Takashi, Ryuma

doi:10.2116/analsci.16.69

Cited by 9 publications

(3 citation statements)

References 12 publications

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“…The source terms were estimated from the known impurities in the precursor to Ta 2 O 5 , tantalum (V) ethoxide (Ta(C 2 H 5 O) 5 ). A previous analysis of tantalum (V) ethoxide found the U/Th content to be <0.04 ng/g (0.047 pg/cm 2 ) in the material (Kozono et al, (2000)). The vendor's chemical analysis yielded <1 ppm (1.169 ng/cm 2 ) of natural potassium (McLean and Watterson (Personal Communication)).…”

Section: Radioactivity In the Reflective Coatingmentioning

confidence: 88%

Development of a low background liquid scintillation counter for a shallow underground laboratory

Erchinger

Aalseth

Bernacki

et al. 2015

Applied Radiation and Isotopes

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Pacific Northwest National Laboratory has recently opened a shallow underground laboratory intended for measurement of lowconcentration levels of radioactive isotopes in samples collected from the environment. The development of a low-background liquid scintillation counter is currently underway to further augment the measurement capabilities within this underground laboratory. Liquid scintillation counting is especially useful for measuring charged particle (e.g., β, α) emitting isotopes with no (or very weak) gamma-ray yields. The combination of high-efficiency detection of charged particle emission in a liquid scintillation cocktail coupled with the low-background environment of an appropriately-designed shield located in a clean underground laboratory provides the opportunity for increased-sensitivity measurements of a range of isotopes. To take advantage of the 35 meters-waterequivalent overburden of the underground laboratory, a series of simulations have evaluated the scintillation counter's shield design requirements to assess the possible background rate achievable. This report presents the design and background evaluation for a shallow underground, low background liquid scintillation counter design for sample measurements.

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Section: Radioactivity In the Reflective Coatingmentioning

confidence: 88%

Development of a low background liquid scintillation counter for a shallow underground laboratory

Erchinger

Aalseth

Bernacki

et al. 2015

Applied Radiation and Isotopes

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show abstract

“…A column for anion-exchange chromatography to separate the matrix (tantalum) from impurities was built directly into the system of sample introduction into the ICP. 10 Determination of contaminants in silicon and germanium on the ICP-MS spectrometer ELEMENT achieved their preconcentration by halogenation and distillation of the probe matrix from the solution. 35 The detection limits for the contaminants were 10 711 mass % ± 10 76 mass %.…”

Section: Sampling Proceduresmentioning

confidence: 99%

Analysis of high-purity solids by atomic emission spectroscopy and mass spectrometry with atom excitation and ionisation in inductively coupled plasma

Shelpakova¹,

Сапрыкин²

2005

Russ. Chem. Rev.

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“…For the determination of impurity elements in tantalum materials, anion/cation exchange or solvent extraction pretreatment procedures have been reported in combination with inductively coupled plasma atomic emission spectrometry (ICP-AES), spectrophotometry or inductively coupled plasma mass spectrometry (ICP-MS). [4][5][6][7][8][9] Some studies employed graphite furnace atomic absorption spectrometry (GFAAS) without matrix separation. 10,11 However, such reports did not focus on non-metallic elements such as phosphorus, boron, silicon, etc., although these elements are often used as donors or acceptors in electronic devices.…”

Section: Introductionmentioning

confidence: 99%

Determination of boron in high-purity tantalum materials by on-line matrix separation/inductively coupled plasma mass spectrometry

Kozono

Takahashi

2002

Analyst

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A method for the determination of ultratrace amounts of boron in high-purity tantalum materials [tantalum metal, tantalum(v) oxide, tantalum pentachloride and tantalum pentaethoxide] is described. On-line anion-exchange matrix separation combined with inductively coupled plasma mass spectrometry (ICP-MS) was employed for the determination of boron at the ng g(-1) level. Tantalum materials were dissolved using HF and/or HNO3 prior to analysis. The loss of boron in the sample preparation procedure was examined as the recovery of boron by adding a definite amount of boron to each tantalum material sample before decomposition, and it was almost negligible. In an anion-exchange method using 0.1 M HF carrier solution, tantalum and boron in the sample solution were first adsorbed on a strongly basic anion-exchange resin. Next, boron was eluted from the resin with 5 M HCl, whereas tantalum was retained strongly adsorbed. The eluted boron was introduced directly into the ICP-MS system for quantitative analysis at m/z 10 and 11. Because of the long elution time of boron, the transient signal was integrated in the time range 70-300 s on the chromatogram. Although the elution of boron in the time range was ca. 40% of total boron in the sample solution injected, the determination limits (10sigma) obtained by the present method were 30, 25, 15 and 13 ng g(-1) for tantalum metal, tantalum(v) oxide, tantalum pentachloride and tantalum pentaethoxide, respectively. The method was applied to the determination of boron in commercially available high-purity tantalum materials and it was found that the concentrations of boron were in the ng g(-1)-microg g(-1) range.

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Determination of Ultratrace Impurities in High Purity Tantalum Materials by On-line Anion Exchange Matrix Separation and Inductively Coupled Plasma Mass Spectrometry

Cited by 9 publications

References 12 publications

Development of a low background liquid scintillation counter for a shallow underground laboratory

Development of a low background liquid scintillation counter for a shallow underground laboratory

Analysis of high-purity solids by atomic emission spectroscopy and mass spectrometry with atom excitation and ionisation in inductively coupled plasma

Determination of boron in high-purity tantalum materials by on-line matrix separation/inductively coupled plasma mass spectrometry

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