Silicon-based
photodetectors are important optoelectronic devices
in many fields. Many investigations have been conducted to improve
the performance of silicon-based photodetectors, such as spectral
responsivity and sensitivity in the ultraviolet band. In this study,
we combine the surface structure engineering of silicon with wide-bandgap
semiconductor SnO2 films to realize textured Si-based heterojunction
photodetectors. The obtained SnO2/T-Si photodetectors exhibit
high responsivity ranging from ultraviolet to near-infrared light.
Under a bias voltage of 1 V, SnO2/T-Si photodetectors (PDs)
with an inverted pyramid texture show the best performance, and the
typical responsivities to ultraviolet, visible, and near-infrared
light are 0.512, 0.538, 1.88 (800 nm, 67.7 μW/cm2) A/W@1 V, respectively. The photodetectors exhibit short rise and
decay times of 18.07 and 29.16 ms, respectively. Our results demonstrate
that SnO2/T-Si can serve as a high-performance broadband
photodetector.