2017
DOI: 10.1063/1.4995770
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Development of a 20 mA negative hydrogen ion source for cyclotrons

Abstract: Effect due to plasma electrode adsorbates upon the negative ion current and electron current extracted from a negative ion source AIP Conference Proceedings 1869, 030025 (2017) Abstract. A cesiated DC negative ion source has been developed for proton cyclotrons in medical applications. A continuous H − beam of 23 mA was stably extracted at an arc power of 3 kW. The beam current gradually decreases with a constant arc power and without additional Cs injection and the decay rate was about 0.03 mA (0.14%) per hou… Show more

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Cited by 9 publications
(4 citation statements)
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“…3) Smallsize negative ion sources are now under development for applications in accelerators in medical fields. 4) Negative ion sources have recently received a significant attention owing to their application in microelectronics fields, such as proton implantation for surface modification, or smart-ion-beam cut of wafers, 5,6) as the charge-up problem of positive ion injection can be avoided.…”
mentioning
confidence: 99%
“…3) Smallsize negative ion sources are now under development for applications in accelerators in medical fields. 4) Negative ion sources have recently received a significant attention owing to their application in microelectronics fields, such as proton implantation for surface modification, or smart-ion-beam cut of wafers, 5,6) as the charge-up problem of positive ion injection can be avoided.…”
mentioning
confidence: 99%
“…Japan A caesiated filament-driven multicusp H − source is being developed for medical cyclotrons at Sumitomo Heavy Industries. The source can produce 23 mA CW beams [34].…”
Section: D-pace Filament Source Canadamentioning
confidence: 99%
“…The negative hydrogen ion(H − ) sources have various applications, for example, high energy particle physics [1,2], fusion plasma heating [3][4][5][6] and medical applications [7,8]. H − ion sources are required to produce high intensity beams with good convergence for these applications.…”
Section: Introducitonmentioning
confidence: 99%