Multiphoton lithography
inside a mesoporous host can
create optical
components with continuously tunable refractive indices in three-dimensional
(3D) space. However, the process is very sensitive at exposure doses
near the photoresist threshold, leading previous work to reliably
achieve only a fraction of the available refractive index range for
a given material system. Here, we present a method for greatly enhancing
the uniformity of the subsurface micro-optics, increasing the reliable
index range from 0.12 (in prior work) to 0.37 and decreasing the standard
deviation (SD) at threshold from 0.13 to 0.0021. Three modifications
to the previous method enable higher uniformity in all three spatial
dimensions: (1) calibrating the planar write field of mirror galvanometers
using a spatially varying optical transmission function which corrects
for large-scale optical aberrations; (2) periodically relocating the
piezoelectrically driven stage, termed piezo-galvo dithering, to reduce
small-scale errors in writing; and (3) enforcing a constant time between
each lateral cross section to reduce variation across all writing
depths. With this new method, accurate fabrication of optics of any
index between n = 1.20 and 1.57 (SD < 0.012 across
the full range) was achieved inside a volume of porous silica. We
demonstrate the importance of this increased accuracy and precision
by fabricating and characterizing calibrated two-dimensional (2D)
line gratings and flat gradient index lenses with significantly better
performance than the corresponding control devices. As a visual representation,
the University of Illinois logo made with 2D line gratings shows significant
improvement in its color uniformity across its width.