2019
DOI: 10.3390/app9214606
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Development of a SnS Film Process for Energy Device Applications

Abstract: Tin monosulfide (SnS) is a promising p-type semiconductor material for energy devices. To realize the device application of SnS, studies on process improvement and film characteristics of SnS is needed. Thus, we developed a new film process using atomic layer deposition (ALD) to produce SnS films with high quality and various film characteristics. First, a process for obtaining a thick SnS film was studied. An amorphous SnS2 (a-SnS2) film with a high growth rate was deposited by ALD, and a thick SnS film was o… Show more

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Cited by 24 publications
(16 citation statements)
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“…37,58−60 The SnS 2 phase is generally obtained below 350 °C, while above this temperature thermal decomposition occurs, and SnS is formed by a redox mechanism involving the extrusion of excess sulfur. 55,60 In the present article, we have demonstrated that SnO 2 sulfurization can selectively produce SnS or SnS 2 phases over the same temperature range (300−400 °C) by using either TBT or TBDS as sulfurizing agents. Reactivity and thermal properties of these two organosulfur compounds should be taken into consideration to understand the origin of such selectivity.…”
Section: ■ Resultsmentioning
confidence: 66%
“…37,58−60 The SnS 2 phase is generally obtained below 350 °C, while above this temperature thermal decomposition occurs, and SnS is formed by a redox mechanism involving the extrusion of excess sulfur. 55,60 In the present article, we have demonstrated that SnO 2 sulfurization can selectively produce SnS or SnS 2 phases over the same temperature range (300−400 °C) by using either TBT or TBDS as sulfurizing agents. Reactivity and thermal properties of these two organosulfur compounds should be taken into consideration to understand the origin of such selectivity.…”
Section: ■ Resultsmentioning
confidence: 66%
“…41 The peak at 161.2 eV is responsible for 2p 3/2 present in SnS. 41 Thus, these results clearly indicate the formation of a pure single SnS phase through the LPE method.…”
Section: Resultsmentioning
confidence: 87%
“…2d) showed two prominent doublet spin–orbit peaks at 485.8 eV and 494.2 eV corresponding to Sn 2+ 3d 5/2 and Sn 2+ 3d 3/2 , respectively, which are recognized to the binding energy of Sn 2+ in the synthesized SnS. 41 The peak at 161.2 eV is responsible for 2p 3/2 present in SnS. 41 Thus, these results clearly indicate the formation of a pure single SnS phase through the LPE method.…”
Section: Resultsmentioning
confidence: 90%
“…The photoresponsivity ( R λ = I ph /PS ) of a phototransistor is defined as the ratio of the generated photocurrent ( I ph = I light − I dark ) in response to the optical power density ( P ) impinging on the detector ( S : illuminated area). The wavelength‐dependent I ph showed two spectral spikes at 2.61 eV (475 nm) and 2.36 eV (525 nm) in line with the absorption peaks of n ‐MoSe 2 [ 34 ] and p ‐SnS, [ 35 ] respectively. The power‐dependent output curves of the anti‐ambipolar heterotransistor (Figure 6b) were also measured at V g = 40 V with a 532‐nm excitation laser of the power density from 40 µW cm −2 to 81.5 mW cm −2 .…”
Section: Resultsmentioning
confidence: 92%