2013
DOI: 10.7567/jjap.52.11nc06
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Development of an In situ Infrared Spectroscopic Measurement of Plasma-Induced Reactions in Ethanol

Abstract: An in situ monitoring system for plasma-induced reactions in ethanol was developed by infrared absorption spectroscopy in multiple internal reflection geometry. We monitored in situ the preferential decrease in the IR peak intensity of CH3 and OH groups in liquid ethanol. In addition, we monitored in situ the preferential inclusion of OCH3 and free OH groups deposited on a multiple internal reflection prism. Unlike optical emission spectroscopy, the IR-based technique detects non-light-emitting compounds. It p… Show more

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Cited by 4 publications
(5 citation statements)
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“…The significant radicals related to the reforming process include O, H, OH, HO 2 , and CH 3 for the production of CH 4 , H 2 O, and syngas (CO + H 2 ). The OH and CH 3 groups of the ethanol molecules are preferentially decomposed in the plasma-assisted reforming process . Initial H 2 production is generated via two pathways: fuel and water dissociation by electron impact.…”
Section: Plasma Techniquementioning
confidence: 99%
See 1 more Smart Citation
“…The significant radicals related to the reforming process include O, H, OH, HO 2 , and CH 3 for the production of CH 4 , H 2 O, and syngas (CO + H 2 ). The OH and CH 3 groups of the ethanol molecules are preferentially decomposed in the plasma-assisted reforming process . Initial H 2 production is generated via two pathways: fuel and water dissociation by electron impact.…”
Section: Plasma Techniquementioning
confidence: 99%
“…The OH and CH 3 groups of the ethanol molecules are preferentially decomposed in the plasma-assisted reforming process. 76 Initial H 2 production is generated via two pathways: fuel and water dissociation by electron impact. In the plasma region, during the first 10−100 μs, the primary sources of atoms and radicals (O, OH, H, CH 3 , CH 2 OH, C 2 H 5 O, and C 2 H 5 ) are electron−molecular dissociation reactions of primary components.…”
Section: Mechanism Of Plasma-assisted Reformingmentioning
confidence: 99%
“…Appropriate monomers can form SAMs on a Si surface by siloxane (Si-O) bonds [21]. This advantage is particularly beneficial for us, because we have developed "infrared absorption spectroscopy in multiple internal reflection geometry" (MIR-IRAS) using MIR prism made from a Si wafer [30][31][32][33][34]. The study investigates the reaction of atmosphericair plasma with the abovementioned SAM using MIR-IRAS.…”
Section: Introductionmentioning
confidence: 99%
“…Moreover, some monomers can be bonded with a Si substrate using siloxane (Si-O) bonds [13][14][15]17) to form a monolayer. This advantage is particularly beneficial for us because we have developed infrared absorption spectroscopy in multiple internal reflec-tion geometry (MIR-IRAS) [18][19][20][21][22] using an MIR prism made from a Si wafer.…”
Section: Introductionmentioning
confidence: 99%