Development of Cellulose Derivative Mold for Imprint Lithography

Abstract

A cellulose derivative mold is used in imprint lithography and possesses great gas permeability. The gas permeable mold enables the minimization of the pattern failure caused by the accumulation of gas generated from imprinted material. This study aims to introduce a cellulose-based gas permeable mold for patterning UV-curable resin containing a volatile solvent. The measurement of the contact angles of the mold surface, dissolution test for the volatile solvent, and imprint lithography showed that the gas permeable mold has great imprinting repeatability and solvent resistance. We expect that imprint lithography using the gas permeable mold derived from the cellulose and materials containing volatile solvent will enable pattern failure reduction, repeatable imprinting, and decrease in the viscosity of the imprinted material.