In this letter, we proposed solution-processed AlInZnO (AIZO)/InZnO (IZO) dual-channel thin-film transistors to realize both proper switching behavior and competitive device performance at the low annealing temperature of 350 • C. A thin IZO layer provides a higher carrier concentration, thereby maximizing the charge accumulation and yielding high saturation mobility μ sat , whereas a thick AIZO layer controls the charge conductance resulting in suitable threshold voltage V th . We therefore obtain excellent device characteristics at 350 • C with μ sat of 1.57 cm 2 /V · s, V th of 1.28 V, an on/off ratio of ∼1.4 × 10 7 , and a subthreshold gate swing of 0.59 V/dec. Index Terms-Display device, indium zinc oxide (IZO), low temperature, solution process, thin-film transistor (TFT).