2016
DOI: 10.1557/mrc.2016.49
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Development of solution-processed nanowire composites for opto-electronics

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Cited by 3 publications
(2 citation statements)
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“…Non-solution-based methods have included chemical vapor deposition to coat wires with graphene or other materials , including the deposition of boron nitride on Cu nanowires . Atomic layer deposition (including spatial atomic layer deposition) has also been deployed to coat Ag and Cu nanowires conformally with oxides. , Finally, physical vapor deposition methods such as magnetron sputtering have been explored in the past as a promising means of encapsulating percolation-based TEs …”
Section: Introductionmentioning
confidence: 99%
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“…Non-solution-based methods have included chemical vapor deposition to coat wires with graphene or other materials , including the deposition of boron nitride on Cu nanowires . Atomic layer deposition (including spatial atomic layer deposition) has also been deployed to coat Ag and Cu nanowires conformally with oxides. , Finally, physical vapor deposition methods such as magnetron sputtering have been explored in the past as a promising means of encapsulating percolation-based TEs …”
Section: Introductionmentioning
confidence: 99%
“…14,22 Finally, physical vapor deposition methods such as magnetron sputtering have been explored in the past as a promising means of encapsulating percolation-based TEs. 23 While solution-based methods for applications such as photovoltaics are promising and often cited as low-cost methods, most of them are processing-intensive and slow, which limit high-throughput production applications. 24 Meanwhile, other methods under development such as spatial atomic layer deposition, which offer a very promising avenue for versatile deposition, 25 require new hardware innovation, integration, and scale-up, in addition to pyrophoric precursor gases, which will limit their immediate applicability for a majority of existing infrastructures.…”
Section: ■ Introductionmentioning
confidence: 99%