“…To date, a range of fabrication methods have been used for the preparation of semiconducting SnS films. 14 These include atomic layer deposition (ALD), 7 chemical vapour deposition (CVD), 5 , 15 thermal evaporation, 4 , 8 sputtering, 16 sulfurisation, 12 spray pyrolysis, 3 , 17 electrodeposition, 9 successive ionic layer adsorption and reaction (SILAR) 18 or chemical bath deposition (CBD). 19 – 21 However, these techniques are, to a large extent, either vacuum-based or involve slow deposition rates, which is not favourable for low-cost and large-scale production.…”