Development of the phase composition and the properties of Ti2AlC and Ti3AlC2 MAX-phase thin films – A multilayer approach towards high phase purity

Torres, Carlos; Quispe, Roger; Calderon, N. Z.; Eggert, Lara; Hopfeld, Marcus; Rojas, Christopher; Camargo, Magali Karina; Bund, Andreas; Schaaf, Peter; Grieseler, Rolf

doi:10.1016/j.apsusc.2020.147864

Cited by 35 publications

(15 citation statements)

References 54 publications

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“…The XRD spectrum of Ti 3 AlC 2 additionally shows the formation of some aluminum oxide (Al 2 O 3 ) at the surface due to Al out‐diffusion during annealing. [ 35 ] Minor Al 2 O 3 peaks are located at 29.21° and 34.78°. Due to their low intensity, Al 2 O 3 has minor or even negligible contributions to the evaluated properties.…”

Section: Resultsmentioning

confidence: 99%

“…Hardness values found in the literature range between 4.5–15.8 and 1.0–11.4 GPa for Ti 2 AlC and Ti 3 AlC 2 , respectively. [ 35 ] It can be seen that the hardness shows a significant scattering for both thin films for low penetration depths or low applied loads. The roughness of the Ti 2 AlC (4 nm) and Ti 3 AlC 2 (12 nm) films may influence the standard deviation of the measurements at low penetration depths.…”

Section: Resultsmentioning

confidence: 99%

“…Thin-Film Deposition: Ti 2 AlC and Ti 3 AlC 2 thin films were synthesized according to the synthesis route presented by Torres et al [35] As shown in Figure 9a, a multilayer arrangement of single element layers of titanium (Ti), aluminum (Al), and carbon (C) were deposited on a Si (100)-wafer by direct current (DC) magnetron sputtering. The sequence of the layers was Ti (%14 nm), Al (%6 nm), and C (%3.5 nm) from the bottom to the top layer.…”

Section: Methodsmentioning

confidence: 99%

“…These temperatures were established as appropriate to form the mentioned MAX phases. [ 35 ] The holding time at the maximum temperature was 300 s. Finally, the samples were cooled down to room temperature with a rate of 5 K s −1 .…”

Section: Methodsmentioning

confidence: 99%

See 3 more Smart Citations

Tribological and Mechanical Performance of Ti₂AlC and Ti₃AlC₂ Thin Films

Quispe¹,

Torres²,

Eggert

et al. 2022

Adv Eng Mater

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Mn+1AXn (MAX) phases are novel structural and functional materials with a layered crystal structure. Their unique properties such as good machinability, high electrical conductivity, low friction, and corrosion resistance are appealing for many engineering applications. Herein, Ti2AlC and Ti3AlC2 MAX thin films are synthesized by magnetron sputtering and subsequent thermal annealing. A multilayer approach is used to deposit single‐element nanolayers of titanium, aluminum, and carbon onto silicon substrates with a double‐layer‐diffusion barrier of SiO2 and SixNy. Ti2AlC and Ti3AlC2 thin films (thickness ≈500 nm) are formed via rapid thermal annealing and verified by X‐Ray diffraction. Nanoindentation tests show hardness values of about 11.6 and 5.3 GPa for Ti2AlC and Ti3AlC2, respectively. The tribological behavior of the Ti2AlC and Ti3AlC2 thin films against AISI 52100 steel balls under dry sliding conditions is studied using ball‐on‐flat tribometry. The resulting coefficient of friction (CoF) for Ti2AlC and Ti3AlC2 ranges between 0.21–0.42 and 0.64–0.91, respectively. The better tribological behavior observed for Ti2AlC thin films is ascribed to its smaller grain size, reduced surface roughness, and higher hardness.

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Section: Resultsmentioning

confidence: 99%

Section: Resultsmentioning

confidence: 99%

Section: Methodsmentioning

confidence: 99%

Section: Methodsmentioning

confidence: 99%

See 2 more Smart Citations

Tribological and Mechanical Performance of Ti₂AlC and Ti₃AlC₂ Thin Films

Quispe¹,

Torres²,

Eggert

et al. 2022

Adv Eng Mater

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Section: New Mxenes Discoverymentioning

confidence: 99%

Potential of MXene-Based Heterostructures for Energy Conversion and Storage

et al. 2021

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In Situ Synthesis of MXene with Tunable Morphology by Electrochemical Etching of MAX Phase Prepared in Molten Salt

Liu

Zschiesche

Antonietti

et al. 2022

Advanced Energy Materials

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early transition metal, A stands for an element from group 13-16, X is carbon and/ or nitrogen, and T represents the surface groups originating from the etching procedure. [5] Over the last decade, hazardous HF solutions were mainly used as the etchant, which inevitably poses safety concerns and limits the scalable preparation. [4,6] In addition, the conventional HFetching preparation method of MXene limits the surface of functional groups to F, OH, and O, which is a clear bottleneck for optimizing their electrochemical properties. [7] Accordingly, efforts aimed to discover environmental-friendly F-free synthesis routes over-controlled surface termination, are in progress worldwide.Recently, a general molten salt synthetic route was reported to prepare MXenes (termed as MS-MXene) by using Lewis acidic melts (ZnCl 2 , CuCl 2 , etc.) for etching MAX. Interestingly, by playing with the wide range of elements for the A-site of the MAX precursors (Zn, Al, Si, Ga) and the Lewis acid melt composition, this method broadens the choice of MAX-phase families for MXene fabrication with great opportunities to tune their surface chemistries. [7] The as-prepared Cl and O-terminated MXene used as a negative electrode in Li-ion-containing electrolyte could deliver a capacity of about 200 mAh g −1 at a 1 C rate. Unfortunately, the whole process is time-consuming and complicated, which involves the preparation of MAX, the etching of MAX to MXene, and the MXenes, a rapidly growing family of 2D transition metal carbides, carbonitrides, and nitrides, are one of the most promising high-rate electrode materials for energy storage. Despite the significant progress achieved, the MXene synthesis process is still burdensome, involving several procedures including preparation of MAX, etching of MAX to MXene, and delamination. Here, a one-pot molten salt electrochemical etching (E) method is proposed to achieve Ti 2 C MXene directly from elemental substances (Ti, Al, and C), which greatly simplifies the preparation process. In this work, different carbon sources, such as carbon nanotubes (CNT) and reduced graphene oxide (rGO), are reacted with Ti and Al micro-powders to prepare Ti 2 AlC MAX with 1D and 2D tuned morphology followed by in situ electrochemical etching from Ti 2 AlC MAX to Ti 2 CT x MXene in low-cost LiCl-KCl. The introduction of the O surface group via further ammonium persulfate (APS) treatment can act in concert with Cl termination to activate the pseudocapacitive redox reaction of Ti 2 CCl y O z in the non-aqueous electrolyte, resulting in a Li + storage capacity of up to 857 C g −1 (240 mAh g −1 ) with a high rate (86 mAh g −1 at 120 C) capability, which makes it promising for use as an anode material for fast-charging batteries or hybrid devices in a non-aqueous energy storage application.

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Development of the phase composition and the properties of Ti2AlC and Ti3AlC2 MAX-phase thin films – A multilayer approach towards high phase purity

Cited by 35 publications

References 54 publications

Tribological and Mechanical Performance of Ti₂AlC and Ti₃AlC₂ Thin Films

Tribological and Mechanical Performance of Ti₂AlC and Ti₃AlC₂ Thin Films

Potential of MXene-Based Heterostructures for Energy Conversion and Storage

In Situ Synthesis of MXene with Tunable Morphology by Electrochemical Etching of MAX Phase Prepared in Molten Salt

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Development of the phase composition and the properties of Ti2AlC and Ti3AlC2 MAX-phase thin films – A multilayer approach towards high phase purity

Cited by 35 publications

References 54 publications

Tribological and Mechanical Performance of Ti2AlC and Ti3AlC2 Thin Films

Tribological and Mechanical Performance of Ti2AlC and Ti3AlC2 Thin Films

Potential of MXene-Based Heterostructures for Energy Conversion and Storage

In Situ Synthesis of MXene with Tunable Morphology by Electrochemical Etching of MAX Phase Prepared in Molten Salt

Contact Info

Product

Resources

About

Tribological and Mechanical Performance of Ti₂AlC and Ti₃AlC₂ Thin Films

Tribological and Mechanical Performance of Ti₂AlC and Ti₃AlC₂ Thin Films