Development rate of PMMA exposed to synchrotron x-ray radiation for LIGA applications

In this study, two kinds of copper micro-patterned surfaces with different heights were fabricated by using a powder injection molding (PIM) process. The micro-pattern’s size was 100 μm, and the gap size was 50 μm. The short micro-pattern’s height was 100 μm, and the height of the tall one was 380 μm. A copper powder and wax-polymer-based binder system was used to fabricate the micro-patterned surfaces. The critical heat flux (CHF) and heat transfer coefficient (HTC) during pool-boiling tests were measured with the micro-patterned surfaces and a reference plain copper surface. The CHF of short and tall micro-patterned surfaces were 1434 and 1444 kW/m2, respectively, and the plain copper surface’s CHF was 1191 kW/m2. The HTC of the plain copper surface and the PIM surface with short and tall micro-patterned surfaces were similar in value up to a heat flux 1000 kW/m2. Beyond that value, the plain surface quickly reached its CHF, while the HTC of the short micro-patterned surface achieved higher values than that of the tall micro-patterned surface. At CHF, the maximum values of HTC for the short micro-pattern, tall micro-pattern, and the plain copper surface were 68, 58, and 57 kW/m2 K.

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“…% 2-aminoethanol, and 15 vol. % deionized water) [31,33]. Two kinds of PMMA plates with different thicknesses were used.…”

Section: Methodsmentioning

confidence: 99%

Fabrication of Micro-Patterned Surface for Pool-boiling Enhancement by Using Powder Injection Molding Process

et al. 2019

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“…It consisted of 60% 2-(2-butoxy-ethoxy)ethanol, 20% tetra-hydro-1, 4-oxazine, 5% 2-aminoethanol-1 and 15% water by volume. These materials were known to work well for LIGA and were good enough for controlling surface roughness [24]. The exposed region was far from the edge to minimize stress effects and PMMA samples were developed immediately after the exposure process to avoid any possible cracks [24,29].…”

Section: Methodsmentioning

confidence: 99%

“…These materials were known to work well for LIGA and were good enough for controlling surface roughness [24]. The exposed region was far from the edge to minimize stress effects and PMMA samples were developed immediately after the exposure process to avoid any possible cracks [24,29]. The developing temperature was maintained at 40 • C in a temperature-controlled bath.…”

Section: Methodsmentioning

confidence: 99%

“…Finally, the development simulation calculates the resist dissolution process based on the results of exposure simulation. The related development parameters such as dissolution rate, dissolution vector and development curve have been researched and discussed [12,20,[23][24][25][26]. Concisely speaking, the dissolution rate R(D), as a function of D for a PMMA resist in x-ray lithography, is often approximated by [12,20,23]…”

Section: Theoretical Modelingmentioning

confidence: 99%

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Motion-path-based three-dimensional x-ray free-form micromachining system

Chuang

Fang

Jiang

et al. 2012

J. Micromech. Microeng.

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This paper presents an x-ray machining system for the fabrication of three-dimensional microstructures with free-form surfaces. The structures with different sizes and various shapes can be generated by a single mask combining with precise moving paths. By adjusting the motions such as path types, overlaps and velocities, various 3D microstructures with complex features can be fabricated. The idea and the construction of this system, fabrication details and successful preliminary experimental results are introduced in this paper.

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“…In addition, the development conditions after exposure also play an important role in affecting the aspect ratio of nano-grating. Many factors affecting the development efficiency of photoresist have been investigated by Mcnamara et al [41]. It was concluded that the effect of synchrotron radiation spectra on the development rate is negligible when the x-ray dose and development temperature are kept constant.…”

Section: Introductionmentioning

confidence: 99%

Process improvement of high aspect ratio nano-gratings based on synchrotron x-ray

Fan

Wang

et al. 2022

Nanotechnology

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To achieve better structural accuracy and aspect ratio, nano-gratings with a vertical angle close to 90° and a depth-to-width ratio of about 8 were prepared by synchrotron radiation. The optimal exposure dose and development time were determined to be 0.006 (A‧h) and 6 min, respectively, by observing the surface loss and roughness of the grating at 150 nm and 250 nm under different conditions. To obtain the desired rectangular grating structure, the experimental conditions were optimized with the help of controlled variables experimental method. With the mask-to-photoresist pitch and the development and drying temperatures of 20 μm and 23 °C, the optimized depth-to-width ratio of the nano-gratings with a line width of 250 nm can reach 8.28. The cone angle can reach 88.4°. The aspect ratio of the nano-gratings with a line width of 150 nm is 7.18, and its cone angle is 87.1°.

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Development rate of PMMA exposed to synchrotron x-ray radiation for LIGA applications

Cited by 7 publications

References 25 publications

Fabrication of Micro-Patterned Surface for Pool-boiling Enhancement by Using Powder Injection Molding Process

Fabrication of Micro-Patterned Surface for Pool-boiling Enhancement by Using Powder Injection Molding Process

Motion-path-based three-dimensional x-ray free-form micromachining system

Process improvement of high aspect ratio nano-gratings based on synchrotron x-ray

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