2006
DOI: 10.1117/12.657010
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Development status of a 193-nm immersion exposure tool

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“…The general process of photolithography is shown in Figure 3 . Photolithography can be further divided into three types: excimer lithography, extreme ultraviolet lithography, and electron beam lithography [ 43 , 44 , 45 , 46 , 47 , 48 , 49 , 50 , 51 ]. Excimer lithography usually relies on the 193 nm ArF immersion technology.…”
Section: The Manufacturing Of Microrobotsmentioning
confidence: 99%
“…The general process of photolithography is shown in Figure 3 . Photolithography can be further divided into three types: excimer lithography, extreme ultraviolet lithography, and electron beam lithography [ 43 , 44 , 45 , 46 , 47 , 48 , 49 , 50 , 51 ]. Excimer lithography usually relies on the 193 nm ArF immersion technology.…”
Section: The Manufacturing Of Microrobotsmentioning
confidence: 99%