Diamond-like carbon film deposition by a 13.56 MHz hollow cathode RF–RF system using different precursor gases

Plasma-Chemical Kinetics of Film Deposition in Argon-Methane and Argon-Acetylene Mixtures Under Atmospheric Pressure Conditions

“…It is well known that presence of sp 1 hybridized carbon will reduce the film hardness because of its linear structure, compared to a film composed of sp 2 and sp 3 carbon based materials. Also it is reported in the literature that methane is better precursor for hard film coating compared to acetylene (Fedosenko et al, 2001). By considering all above stated facts (nature of the precursor, plasma conditions and film properties), the most probable reactions among others are calculated using the equation (19), from the known values of densities of argon, methane and electron, as well as rate constants of various processes determined from the plasma parameters and known in the literature (Alman et al, 2000;Baulch et al, 1994;Denysenko et al, 2004;Pitts et al, 1982;Shiu & Biondi, 1978;Sieck & Lias, 1976;Tsang & Hampson, 1986),…”

Plasma deposition processes from acrylic/methane on natural fibres to control the kinetic release of lysozyme from PVOH monolayer film

“…DLC coating, on the other hand, were deposited always at high input power (550 W) in order to obtain a stable and hard film with a chemical structure close to that of natural diamond (Fedosenko et al, 2001;Li-Ye et al, 2004;Mutsukura and Miyatani, 1995;Sheeja et al, 2003). Table 1 reports the optimized experimental conditions of plasma depositions and the names assigned to the samples.…”

Deposition of in situ surface structured DLC-coatings

“…The low growth rates of common precursor gases [8] make this prohibitively expensive in a lot of cases though.…”