Diffusion of the vacancy defect leading to the formation of multi-shell structures in the nanowire and nanobridge J. Appl. Phys. 112, 114301 (2012) Characterization of defect evolution in ultrathin SiO2 layers under applied electrical stress J. Appl. Phys. 112, 103513 (2012) Fluid like behavior of oxygen in cubic zirconia under extreme conditions Appl. Phys. Lett. 101, 181906 (2012) Out-diffusion of deep donors in nitrogen-doped silicon and the diffusivity of vacancies J. Appl. Phys. 112, 013519 (2012) Additional information on J. Appl. Phys. Thickness dependent Pendell€ osung oscillations are highly sensitive to strain fields from defects in a host crystal. Based on this, we present a novel technique to measure the precipitation kinetics of oxygen in silicon already at its early stage of clustering at high temperatures. At 900 C, precipitates with a radius smaller than 4 nm and with a density of 1 6 0:5 Â 10 13 1/cm 3 were observed. The technique was calibrated by complementary scanning transmission electron microscope and energy dispersive X-ray measurements in the range of normal diffusivity yielding a diffusion constant of 1:7 6 0:1 Â 10 À12 cm 2 =s, which is close to the literature value of 2:074 Â 10 À12 cm 2 =s. The measurements have been made with the characteristic K a1 -line of a high voltage tungsten X-ray tube at 59.31 keV, which provides the opportunity to illuminate through complex sample environments like high temperature scattering furnaces. V C 2013 American Institute of Physics. [http://dx