Diffraction gratings on porous silicon

Alexeev-Popov, A.V.; Gevelyuk, S. A.; Roizin, Ya.; Savin, D. P.; Kuchinsky, S.

doi:10.1016/0038-1098(95)00712-1

Cited by 13 publications

(8 citation statements)

References 3 publications

Supporting

Mentioning

Contrasting

Unclassified

Order By: Relevance

“…A planar periodic multimode waveguide was made and its photonic bandgap properties were researched in ref. 6. In our work, we have developed an experimental setup that allows guide light at 1064nm incidents vertically into the grating in porous silicon optical waveguides.…”

Section: Introductionmentioning

confidence: 99%

“…The periodic structures assume to be obtained by thermal effects, which appear in porous Si film from very low laser beam fluencies. The diffraction gratings were fabricated also by exposure of porous silicon to the focused light of UV low-power laser 6 . Up to twenty diffraction orders could be observed with the naked eye under He-Ne laser illumination.…”

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

Study of holographic grating in porous silicon optical waveguides

Jia

Chu-zhe

2007

3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technolo

View full text Add to dashboard Cite

It was found that the porosity of porous silicon has a maximum value under certain illumination intensity in our experiment. According to the experimental result, the grating was fabricated from porous silicon by controlling illumination intensity. As the refractive index of porous silicon decreases with an increase of the porosity, so the index distributing of porous silicon can be controlled by illumination intensity. A holographic process allows obtaining a mask of light on top layer during fabricating the multilayer porous silicon optical waveguides. The interference of two coherent Ar + laser beams produces at the sample surface bright parallel lines. The porosity is modulated in the plane. The effective deep of modulation is directly related to the penetration of the illuminating beam. We have developed an experimental setup that allows guide light at 1064nm incidents vertically into the grating in porous silicon optical waveguides. The diffractive efficiency of the first order diffraction light in TE and TM polarization are measured in our experiment respectively.

show abstract

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Study of holographic grating in porous silicon optical waveguides

Jia

Chu-zhe

2007

3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technolo

View full text Add to dashboard Cite

show abstract

“…Thin sensing layers have short analyte diffusion times enabling grating-based sensors to have fast response and reset times. PS-based grating sensors have previously been made using pre-etched silicon [2], direct laser writing [3,4], imprinting [5,6], and holography [7]. However, pre-etched silicon cannot achieve uniform layers, laser writing is slow, imprinting makes it difficult to control the optical properties of PS, and holographic methods have limited control of the patterns which can be produced.…”

Section: Introductionmentioning

confidence: 99%

Multilayer porous silicon diffraction gratings operating in the infrared

et al. 2012

View full text Add to dashboard Cite

Transmission diffraction gratings operating at 1,565 nm based on multilayer porous silicon films are modeled, fabricated, and tested. Features down to 2 μm have been patterned into submicron-thick mesoporous films using standard photolithographic and dry etching techniques. After patterning of the top porous film, a second anodization can be performed, allowing an under-layer of highly uniform porosity and thickness to be achieved. High transmission greater than 40% is measured, and modeling results suggest that a change in diffraction efficiency of 1 dB for a 1% change in normalized refractive index can be achieved. Preliminary measurement of solvent vapor shows a large signal change from the grating sensor in agreement with models.

show abstract

“…Although diffraction gratings can be formed in the PS or Si surface by variety of conventional techniques: conventional optical lithography [5] or optical recording [6], periodic length of gratings for coupling purposes in the visible range mostly falls in the submicrometer range. Such a line density is only feasible to achieve and adjustable by using e-beam lithography [7] or holography [8].…”

Section: Introductionmentioning

confidence: 99%

Submicrometer period silicon diffraction gratings by porous etching

Nagy

Volk

Hámori

et al. 2005

Physica Status Solidi (a)

View full text Add to dashboard Cite

We have developed a new technique to manufacture diffraction gratings on porous silicon and on silicon interface. Using holography facilitate to adjust the periodic length of gratings in the submicron range. The holographically exposured and developed photoresist applied on the silicon surface provides the mask for the ion implantation. The sinusoidal grating between the substrate and the porous silicon layer is achieved after the anodic etch process. The PS layer can be removed by alkali etching. Sinusoidal one-and twodimensional diffraction gratings have been produced with 375 nm periodic length. Their AFM images are shown. The diffraction efficiencies were measured.

show abstract

Diffraction gratings on porous silicon

Cited by 13 publications

References 3 publications

Study of holographic grating in porous silicon optical waveguides

Study of holographic grating in porous silicon optical waveguides

Multilayer porous silicon diffraction gratings operating in the infrared

Submicrometer period silicon diffraction gratings by porous etching

Contact Info

Product

Resources

About