Diffractive Optical Elements Based in Brand Glass

Abstract

A Diffractive Optical Element (DOE) based in optical glass substrate was developed in this work. DOEs are lighter, occupy a relatively smaller volume and they can be fabricated using microelectronic processes. These devices had been built by glass etching: first, glass substrate was submitted to a cleanness process; after it was carried through a process of evaporation of an aluminum mask, which will be used to format the device. Before the etching process, a small layer of photo resist was deposited on aluminum, a lithographic process and wet process defines a pattern on the aluminum layer. Plasma etching was made by RIE (Reactive Ion Etching) equipment, remaining the diffractive patterns. The characterizations of these devices are performed by optical analyzes with a 633 nm HeNe laser. The roughness and etch rate of materials after etch process were obtained by Atomic Force Microscopy and high step meter.