Diffusion behavior of Cu in Cu/electroless Ni and Cu/electroless Ni/Sn-37Pb solder joints in flip chip technology

Abstract

For Cu pads used as under bump metallization (UBM) in flip chip technology, the diffusion behavior of Cu in the metallization layer is an important issue. In this study, isothermal interdiffusion experiments were performed at 240°C for different times with solid-solid and liquid-solid diffusion couples assembled in Cu/electroless-Ni (Ni-10 wt.% P) and Cu/electroless Ni (Ni-10 wt.% P)/ Sn-37Pb joints. The diffusion structure and concentration profiles were examined by scanning electron microscopy and electron microprobe analysis. The interdiffusion fluxes of Cu, Ni and P were calculated from the concentration profiles with the aid of Matano plane evaluation. The values ofJ Cu ,J Ni , and J P decreased with increasing annealing time. The average effective interdiffusion coefficients on the order of 10 À14 cm 2 /s were also evaluated within the diffusion zone. The amounts of Cu dissolved in the intermetallic compounds (IMCs) Ni 3 Sn 4 and Ni 3 P that precipitate after annealing the Cu/electroless Ni/ Sn-37Pb joints were about 0.25 at.% and 0.5 at.%, respectively. For the short period of annealing, it appears that the presence of electroless Ni (EN) with the Sn-Pb soldering reaction assisted the diffusion of Cu through the EN layer.

Effect of SiC on the corrosion resistance of electroless Cu–P–SiC composite coating

“…The co-deposition improves the mechanical and tribological properties of coatings. [4][5][6][7] Diversified metallic and nonmetallic surfaces endowed with attractive appearance, high corrosion resistance, electromagnetism, low density, and some other special functions have been produced by electroless copper (EC). Thus, EC technique has been widely used in the electronic industry, aerospace industry, and machinery manufacturing because of its excellent thermal conductivity.…”