1991
DOI: 10.2320/matertrans1989.32.457
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Diffusion in Copper-rich Copper-Silicon Alloys

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1991
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Cited by 9 publications
(13 citation statements)
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“…The results show that the impurity diffusion coefficients of both Ga and Si are higher than the Cu tracer diffusion coefficients [25]. A similar trend was reported by both Iijima et al [15] and Minamino et al [12]. To further understand the atomic mechanism of the diffusing species, it is essential to compute the tracer diffusion coefficients because they eliminate the effect of the chemical driving force on the elements.…”
Section: (C) X-ray Diffraction Measurementssupporting
confidence: 56%
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“…The results show that the impurity diffusion coefficients of both Ga and Si are higher than the Cu tracer diffusion coefficients [25]. A similar trend was reported by both Iijima et al [15] and Minamino et al [12]. To further understand the atomic mechanism of the diffusing species, it is essential to compute the tracer diffusion coefficients because they eliminate the effect of the chemical driving force on the elements.…”
Section: (C) X-ray Diffraction Measurementssupporting
confidence: 56%
“…In the Cu-Ga system, the size misfit is larger than that in the Cu-Si system, but still in [35], the vacancy binding energy is reported to be larger in Cu-Si than in the Cu-Ga system. With respect to this, the tracer diffusion studies carried out in [15], as discussed in §1, on the other hand, indicated that there is only a weak interaction between a vacancy and an Si atom in the Cu matrix.…”
Section: (E) Impurity Vacancy Binding Energymentioning
confidence: 99%
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